1981
DOI: 10.1016/0250-6874(81)80060-1
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pH-sensitive sputtered iridium oxide films

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1983
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Cited by 141 publications
(71 citation statements)
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“…By comparing sensitivity, Nernst response range, ion selectivity, interference of oxidation, the iridium oxide pH electrode has been demonstrated to be the most promising one among all kinds of pH sensors. [17][18][19] The reported fabrication approaches of IrO x pH electrode include electrochemical cyclic voltammetry (CV), [19][20][21][22] electrodeposition, [23][24][25] radio frequency (RF) magnetron sputtering deposition, [26][27][28][29][30] and thermal oxidation. 14,31 Among which, the electrode produced by thermal oxidation exhibited excellent overall performance, including wide E-pH relationship range, fast response time and long term stability.…”
mentioning
confidence: 99%
“…By comparing sensitivity, Nernst response range, ion selectivity, interference of oxidation, the iridium oxide pH electrode has been demonstrated to be the most promising one among all kinds of pH sensors. [17][18][19] The reported fabrication approaches of IrO x pH electrode include electrochemical cyclic voltammetry (CV), [19][20][21][22] electrodeposition, [23][24][25] radio frequency (RF) magnetron sputtering deposition, [26][27][28][29][30] and thermal oxidation. 14,31 Among which, the electrode produced by thermal oxidation exhibited excellent overall performance, including wide E-pH relationship range, fast response time and long term stability.…”
mentioning
confidence: 99%
“…The electrodes have Nernstian re sponse, little hysteresis during pH cycling and acceptable long-term stability [Katsubeet al, 1982], The electrodes are all sol id state and therefore preferable to glass microelectrodes whose fragility is a major short-coming for intraoral application. The sputtered iridium oxide electrode does not seem to have some of the prob lems encountered with other metal wire or metal-metal oxide electrodes that have been proposed for implantable pH sens ing applications [/ves and Janz, 1961;Edwall, 1978], i. e. there is minimal alkali me tal ion and redox interference [Katsube et al, 1982]. Other positive attributes of the present electrode material are: a wide tem perature range of Nernstian operation (0-100°C has been demonstrated); fast re sponding; low impedance -particularly important for a noise-free signal in vivo measurement; the material is etch resis tant, even in the most corrosive environ ments (boiling aqua regia for several hours), therefore long-term material sta bility in the oral environment is expected.…”
Section: Discussionmentioning
confidence: 99%
“…The Hawley appliance was completed by casting acrylic to cover the stainless steel wires, except for the 1-2 mm por tion that extended to the desired chemical sensing lo cation. Tantalum shims were coated with sputtered iridium oxide using a technique that has been report ed elsewhere in detail [Katsube et al, 1982]. Briefly, the tantalum was polished to a mirror finish, cleaned in detergent, rinsed in deionized (DI) water and placed on a water-cooled mount of a sputter chamber evacuated to 5 x I0'* 7 Torr.…”
Section: Methodsmentioning
confidence: 99%
“…In voltammetry, the faradaic current is the signal while the capacitance current is a cornpoñent of the noise. For a potential pulse of amplitude AE, the capacitance current flowing as a result of electric double layer charging/discharging is given by eq (10), ic = (tE/R) exp (-t/RC) (10) where R is the total resistance of the cell, C is the double layer capacitance, and t is the time elapsed after application of the pulse. The capacitance is directly proportional to the electrode area, while for a microdisc the resistance varies inversely with electrode radius (not area) as R = p/4r, where p is the resistivity of the solution (ref.…”
Section: Microelectrodesmentioning
confidence: 99%