Perpendicular anisotropy of sputtered Ni films

Kohmoto, O.; Mineji, N.; Isagawa, Y.; Ono, F.; Kubo, Ozora

doi:10.1016/s0304-8853(01)00523-6

Cited by 16 publications

(8 citation statements)

References 4 publications

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“…Magnetic property of Ni films was study by VSM. The VSM results confirm that Ni films deposited for 90-150 min have a ferromagnetic phase and saturation magnetization is increased whereas coercive field is practically kept constant with increasing deposited time [3,4]. The DTA result of Ni films show an exothermic peak at 850 o C corresponding to decomposition of Ni atoms from the glass substrate.…”

mentioning

confidence: 57%

“…Nickel films have been widely investigated by many researchers [1][2][3][4]. This magnetic film was prepared by many methods such as RF-sputtering [3], DC-magnetron sputtering [1,2,4] and thermal and UHV deposition in a MBE system [5]. Sputtered Ni film and its composites with a high conductivity and dielectric constant were researched to be an electromagnetic interference shielding layers.…”

Section: Introductionmentioning

confidence: 99%

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Nano-Morphological, Magnetic and Structural Properties of Ni Films Prepared by RF-Sputtering

Chanthong¹,

Rattanasakulthong²,

Pinitsoontorn³

et al. 2012

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Sputtered Ni Films with various deposited times (30, 60, 90,120 and 150 min.) were prepared on glass substrate by RF-sputtering in Argon gas to study effects of sputtering time on their morphological, magnetic and thermal properties. Surface morphological of Ni films were investigated by AFM. The AFM images show a small variation of surface roughness with sputtering time. Average surface roughness of Ni films over scan area of 1m x 1m, 5m x 5m and 10m x 10m are about 0.57, 1.64 and 2.49 nm, respectively. The AFM result infers that Ni films prepared by RF-sputtering exhibit surface roughness in order at nano-scale and have smoother surface than that prepared by DC-sputtering [1]. Structure of Ni films was characterized by XRD. The results display that Ni films exhibit a broad peak of Ni (FCC) phase in (111) plane with a hump at 2 = 23 o [1,2]. Intensity of Ni (111) peak is increased with increasing sputtering time. Magnetic property of Ni films was study by VSM. The VSM results confirm that Ni films deposited for 90-150 min have a ferromagnetic phase and saturation magnetization is increased whereas coercive field is practically kept constant with increasing deposited time [3,4]. The DTA result of Ni films show an exothermic peak at 850 o C corresponding to decomposition of Ni atoms from the glass substrate. The results confirm that surface roughness, magnetic and structural properties Ni films prepared by RF sputtering can be improved by an appropriate deposited time.

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mentioning

confidence: 57%

Section: Introductionmentioning

confidence: 99%

Nano-Morphological, Magnetic and Structural Properties of Ni Films Prepared by RF-Sputtering

Chanthong¹,

Rattanasakulthong²,

Pinitsoontorn³

et al. 2012

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“…4, a−c). Известно, что присут-ствие такой доменной структуры является показателем наличия в пленке перпендикулярной магнитной анизо-тропии [28,29]. В пленках с наивысшим содержанием металлов № 13 и 14 (рис.…”

Section: исследование коэффициента отражения композитных пленокunclassified

Структура, проводящие и отражающие свойства аморфных гранулированных композитных пленок (Co-=SUB=-45-=/SUB=-Fe-=SUB=-45-=/SUB=-Zr-=SUB=-10-=/SUB=-)-=SUB=-x-=/SUB=-(ZrO)-=SUB=-1-x-=/SUB=-

Антонец¹,

Котов²,

Голубев³

et al. 2017

Журнал Технической Физики

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“…Note that the film micro structure depends on the parameters of substrate on which the ferromagnetic metal is deposited and the parameters of technological process. In several cases, the selection of substrate [6,7] or variations in the parameters of technological process [8,9] allow signif icant modifications of the microcrystalline structure and variations in the properties of ferromagnetic film. Such methods for control of microstructure and prop erties of ferromagnetic films are widely used in the development of devices based on such films.…”

Section: Introductionmentioning

confidence: 99%

“…The experimental results for the polycrystalline nickel (Ni) films that are fabricated using the dc mag netron sputtering were predominantly obtained for the films with the (111) texture [2,3,8,10]. It is demon strated in [11] for the Ni/Si(111) films that a variation in the potential of the Si substrate allows the fabrica tion of the Ni films with (111) or (200) textures.…”

Section: Introductionmentioning

confidence: 99%

Effect of annealing temperature and rate of sputtering on the magnetic properties and microstructure of the polycrystalline nickel films with (200) texture

Dzhumaliev

Nikulin

Filimonov

2012

J. Commun. Technol. Electron.

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The dependences of the magnetic properties and morphology of polycrystalline nickel (Ni) films with the (200) texture that are fabricated using the dc magnetron sputtering on the SiO 2 /Si(100) substrates on sputtering rate annealing temperature T, and film thickness d are analyzed. It is demonstrated that an increase in the sputtering rate from 17 to 35 nm/min does not affect the saturation magnetization 4πM and ferromagnetic resonance line width ΔH but leads to a significant increase in the coercivity H c for the films whose thickness d is greater than critical thickness d cr (d > d cr ). It is also demonstrated that d cr depends on both sputtering rate and annealing temperature. The films with the thickness d > d cr exhibit the stripe domain structure whose period increases with increasing d and rate v. The annealing of the films with d ≥ 40 nm at T ≈ 200-400°C results in an increase in ΔH and H c by a factor of 2-4, an increase in 4πM by 25%, an increase in grain size ξ by a factor of 20-30, and the formation of the stripe domain structure in the films that do not exhibit such structure prior to annealing and substantial strengthening of the (200) texture.

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Perpendicular anisotropy of sputtered Ni films

Cited by 16 publications

References 4 publications

Nano-Morphological, Magnetic and Structural Properties of Ni Films Prepared by RF-Sputtering

Nano-Morphological, Magnetic and Structural Properties of Ni Films Prepared by RF-Sputtering

Структура, проводящие и отражающие свойства аморфных гранулированных композитных пленок (Co-=SUB=-45-=/SUB=-Fe-=SUB=-45-=/SUB=-Zr-=SUB=-10-=/SUB=-)-=SUB=-x-=/SUB=-(ZrO)-=SUB=-1-x-=/SUB=-

Effect of annealing temperature and rate of sputtering on the magnetic properties and microstructure of the polycrystalline nickel films with (200) texture

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