Periodic patterning using aerial image modulation with optical lithography

Abstract

Abstract. Photolithography for patterns with periodicity in the illumination plane (2.5-D lithography) has seen rapid advances over the past decade, with the introduction of holographic lithography and the further development of phase-contrast and grayscale photolithography methods. However, each of these techniques suffers from substantial difficulties preventing further integration into device fabrication: a lack of parallel processing capabilities and dimension limitations. Here, we present a demonstration of controlled layer topography through modulation of both the exposure dose and exposure focal plane yielding reproducible 2.5-D patterns which are applied to the further development of plasmonic gratings. This process is entirely compatible with commercially available i-line photolithography and etch hardware, enabling a path to ready integration.

Self‐structured serrated edges of chemically oxidized poly(dimethylsiloxane) disks

“…Although photolithography and electron‐beam lithography are top‐down approaches that are widely used for producing nano‐ and micro‐objects or structures, they usually require expensive equipment and multiple time‐consuming processes. Moreover, they are essentially limited to 2‐dimensional patterns and predicted to meet with the limitation of down sizing in the near future. To overcome such disadvantages and limitations, various bottom‐up technologies using supramolecular self‐assembly have been extensively explored for the past few decades .…”