Performance of Intense Pulsed Ion Source

Spatial structures of electronegative plasma produced by internal helical antenna in a uniform magnetic field

“…Recently intensive studies on the inductively coupled plasma (ICP) [1][2][3][4][5] and the helicon [6][7][8][9][10] discharges have been made because they can meet with most plasma processing requirements. These requirements include low working pressure, high densities of ions, electrons and radicals, excellent uniformity over a large diameter (>20 cm), low and controllable ion energies and negligible contamination from reactor sputtering.…”

“…These requirements include low working pressure, high densities of ions, electrons and radicals, excellent uniformity over a large diameter (>20 cm), low and controllable ion energies and negligible contamination from reactor sputtering. In the ICPs, the inductive coupling element has been physically outside the discharge region except for a few applications [4,5], where the coupler was placed inside the discharge region. This design has a distinct advantage in metal sputtering applications [4].…”

“…Metal deposition on the dielectric plasma-vessel walls of nonimmersed ICPs eventually suppresses plasma generation by acting as a single-turn, short-circuited secondary winding. Although impurities in metal film deposited by immersed ICP sputter deposition are a concern in processing applications, immersed coils have successfully been used in ion beam sources where a loop antenna is located in a permanent magnetic bucket vacuum vessel [5]. In this paper, we are representing an immersed type antenna with an axial magnetic field as an external control parameter, which, to our knowledge, has not been studied yet.…”