Performance Investigation of Inverted T-shaped Heterojunction FinFET along with Oxide Stacking.

Verma, Shekhar; Narula, Vishal; Tripathi, Suman Lata; Raj, Balwinder

doi:10.1109/devic57758.2023.10134996

Cited by 1 publication

(1 citation statement)

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“…Different studies have been carried out in the literature to obtain better results by applying various ideas on the device structures such as high K dielectric materials [20][21][22], different semiconductor materials [23][24][25][26], high K spacers [27][28][29], mobility enhancement using strain technology [30][31][32][33]. Moreover, multi-gate junctionless transistors to improve gate control have also been studied [12,27,[34][35][36][37][38][39][40][41]. The study on the performance of device structures after the insertion of the dielectric pockets, ferroelectric as the gate material, thin gate dielectric, source and drain extension [42] etc has been presented in the literature.…”

Section: Image Sensorsmentioning

confidence: 99%

A pathway to improve short channel effects of junctionless based FET’s after incorporating technology boosters: a review

Narula,

Agarwal,

Verma

2024

Eng. Res. Express

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The Short Channel Effects (SCE) are becoming more prominent in Complementary Metal Oxide Semiconductor (CMOS) circuits with an introduction of nanoscale Metal Oxide Semiconductor Field Effect Transistor (MOSFET). The short channel effects (SCE’s) and fabrication challenges have provoked the researchers to think for some other technologies to enhance the market of semiconductor devices. To overcome these SCE’s, various methodologies such as multi-gate structures, material engineering, gate engineering, dielectric pockets, strain technology, high K dielectric material, heterostructures, source and drain extensions etc. have been implemented. However, at very short channel lengths, the sharp edges of doping are difficult to obtain and thus SCE’s have become so difficult to control even after the implementations of different methodologies. Therefore, a new type of technology has been introduced to overcome such pitfalls e.g. transistors without junctions. Junctionless field effect transistor (JLFET) is one of the technologies which has overcome various SCE’s. Although the research on various issues has been addressed by different authors but still there is an impediment in the commercialization of the same device. The different technology boosters have been incorporated into junctionless based devices to escalate the performance. The technology boosting aspect of junctionless FET has been reviewed in this paper which has not been considered yet. In this paper distinct technology boosters and numerous effects on junctionless devices have been studied and presented. The performance of the junctionless FET devices are studied on incorporating the different semiconductor materials, effect of strain, use of high k dielectric, use of dielectric pockets, effect of gate misalignment, use of heterostructures, silicon on nothing (SON), vertically stacked nanowires, newly proposed rectangular core-shell based junctionless FET’s and roles of various physical parameters such as temperature, nanowire widths and effect of scattering mechanism on the performance of JLFET have been addressed.

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