Quantum dot light-emitting diodes
(QLEDs) are expected to be the
basis of next-generation displays and have consequently been extensively
investigated with the aim of commercialization. Herein, QLED brightness,
efficiency, and lifetime are significantly improved by insertion of
an Al2O3 barrier layer via atomic layer deposition
(ALD), which effectively suppresses the etching reaction with poly(3,4-ethylenedioxythiophene):polystyrenesulfonate
and prevents metal ion diffusion from indium tin oxide (ITO) into
the emission layer, thereby effectively reducing the effect of exciton
quenching. The above-mentioned suppression of exciton quenching is
verified using time-resolved photoluminescence spectroscopy/energy-dispersive
X-ray spectroscopy, and a device prepared using four ALD cycles is
shown to exhibit increased maximal luminance (39 410 cd/m2; two times the value achieved without the Al2O3 layer), current efficiency (47.89 cd/A; eight times the value
achieved without the Al2O3 layer), and external
quantum efficiency (12.89%). In addition, all Al2O3-containing QLEDs feature longer lifetimes than the QLED without
Al2O3.