Performance evaluation of WDM components based on tunable dielectric membrane technology

Halbritter, H.; Aziz, Michael J.; Riemenschneider, Frank; Meißner, P.; Strassner, M.; Tarraf, A.; Daga, O. P.

doi:10.1049/ip-cds:20030896

Cited by 2 publications

(1 citation statement)

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“…That is why this filter belongs to the micro opto electro mechanical system (MOEMS). MOEMSdevices like tunable filters [3][4][5] , photodiodes 6 or lasers 1,7,8 that are operating at a wavelength around 1.5µm are interesting for the applications in wavelength division multiplexing (WDM)-optical communication systems 9 , in gas spectroscopy 2 and in fiber-Bragg-grating measurements. 10 The main reason for the interest is the wide continuous tuning range of the wavelength.…”

Section: Introductionmentioning

confidence: 99%

Bulk- micromachined dielectric tunable optical filter realized with inductively coupled plasma chemical vapour deposition

et al. 2008

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We present the characterization of silicon oxide (SiO x ) and silicon nitride (SiN x ) films deposited by inductively coupled plasma chemical vapour deposition (ICP-CVD) at low temperature (< 100 • C). A tunable optical FabryPérot (FP) -filter operating at a wavelength around 1.5µm is realized. It is hybridly assembled with two dielectric distributed Bragg reflectors (DBR). One of the DBR-mirrors is intentionally curved using the intrinsic stress inside the films. Our aim is the development of a tunable surface micromachined VCSEL with a curved dielectric mirror. Therefore ICP-CVD with a low deposition temperature is used for SiO x and SiN x films. As a first step the realization of a tunable bulk-mircomachined optical FP-filter is presented. The refractive index, deposition rate, stress and etching rate in buffered hydrofluoric acid (BHF) of thin dielectric films (<500 nm) in dependence on deposition temperature and on gas flow ratio are investigated. The knowledge of the deposition characteristics of the dielectric films is used to realize DBRs with a given curvature that are applied to electrothermally actuated, optical tunable FP-filters. The presented filter has a free spectral range of 29 nm, an insertion loss of 10 dB and a full width half maximum of 0.16 nm.

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