Performance characteristics of the Genus Inc. Tandetron/sup TM/ 1520 MeV ion implantation system

Abstract

As the MeV ion implantation market expands and matures, the tools used for the high energy processes must meet stringent customer requirements. In order to meet the needs of production users, Genus Inc. has developed the Tandetron" 1520 MeV ion implantation system. The Tandetron" 1520 is a third-generation high energy ion implanter which evolved from the successful Genus 1510 system. In this work, a review of the key performance characteristics of the system are presented. Included are parameters such as beam generation, implant profiles, wafer throughputs, particle performance, automation capabilities, and maintainability. In particular, the following features are highlighted: (1) energy range expansion, (2) footprint reduction, (3) ion source innovations, (4) control system and user interface enhancements, and, (5) maintenance simplification.