“…In 2008 the memristor predicted by Chua was first confirmed and built. 83 A valence-change memristor is typically made up of a sub-stoichiometric transition metal oxide (e.g., HfO x , 85,[93][94][95][96][97][98][99][100][101][102][103][104][105][106][107][108][109][110][111][112] TaO x , 74,104,107,113,114 TiO x , 114,115 AlO x , 97,100,101,104,106,116 NiO x , 117 etc.) and requires an electroforming step to create a filamentary conducting path, comprising oxygen vacancy defects, within the oxide network with the electrodes typically non-active metals.…”