2010
DOI: 10.1021/ar100066t
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Perfluorophenyl Azides: New Applications in Surface Functionalization and Nanomaterial Synthesis

Abstract: ConspectusA major challenge in materials science is the ongoing search for coupling agents that are readily synthesized, capable of versatile chemistry, able to easily functionalize materials and surfaces, and efficient in covalently linking organic and inorganic entities. A decade ago, we began a research program investigating perfluorophenylazides (PFPAs) as the coupling agents in surface functionalization and nanomaterial synthesis. The p-substituted PFPAs are attractive heterobifunctional coupling agents b… Show more

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Cited by 198 publications
(190 citation statements)
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“…We are confident that the latter insight will provide solid ground for the design of yet faster strain-promoted cycloadditions. A practical convenience of the IED reactions reported herein furthermore lies in the fact that BCN and several of the aromatic azides are readily synthesized or commercially available, such as, for example, photoaffinity labelling reagents based on azidotetrafluorobenzoic acid 38 . It is clear that the reaction rate constants of the here presented accelerated IED SPAAC still lag far behind those involved with IED cycloadditions of tetrazines.…”
Section: Discussionmentioning
confidence: 99%
“…We are confident that the latter insight will provide solid ground for the design of yet faster strain-promoted cycloadditions. A practical convenience of the IED reactions reported herein furthermore lies in the fact that BCN and several of the aromatic azides are readily synthesized or commercially available, such as, for example, photoaffinity labelling reagents based on azidotetrafluorobenzoic acid 38 . It is clear that the reaction rate constants of the here presented accelerated IED SPAAC still lag far behind those involved with IED cycloadditions of tetrazines.…”
Section: Discussionmentioning
confidence: 99%
“…Typically, multi-layer organic frameworks experience poor performance or device failure because of erosion during layer-by-layer processing. To avoid this erosion, Bis-FB-N 3 was used to crosslink the alkyl chains in P3HT thin films via light-catalysed N-H insertion reactions 25 . The Bis-FB-N 3 acts as a negative photoresistor responding to 254 nm ultraviolet light and allows patterning of common alkylated organic materials 23,25 .…”
Section: Resultsmentioning
confidence: 99%
“…To avoid this erosion, Bis-FB-N 3 was used to crosslink the alkyl chains in P3HT thin films via light-catalysed N-H insertion reactions 25 . The Bis-FB-N 3 acts as a negative photoresistor responding to 254 nm ultraviolet light and allows patterning of common alkylated organic materials 23,25 . Crosslinking with Bis-FB-N 3 imbues the organic layer with a robust resistance against common organic solvents used for spin coating.…”
Section: Resultsmentioning
confidence: 99%
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“…On the other hand, perfluorophenyl azide (PFPA) has a suitable reactivity coupling with carbon materials under moderate conditions and a variety of papers regarding the reaction for PFPA toward carbon materials have been reported by Yan et al [32][33][34][35][36]. In this case, the immobilized carbon materials have no introduction of polar groups because the reaction is carried out between a nitrene and a C=C bond.…”
Section: Introductionmentioning
confidence: 99%