2016
DOI: 10.1088/0957-4484/27/12/125706
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Percolative switching in transition metal dichalcogenide field-effect transistors at room temperature

Abstract: We have addressed the microscopic transport mechanism at the switching or "on-off" transition in transition metal dichalcogenide (TMDC) field-effect transistors (FET), which has been a controversial topic in TMDC electronics, especially at room temperature. With simultaneous measurement of channel conductivity and its slow time-dependent fluctuation (or noise) in ultra-thin WSe2 and MoS2 FETs on insulating SiO2 substrates, where noise arises from McWhorter-type carrier number fluctuations, we establish that th… Show more

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Cited by 26 publications
(34 citation statements)
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References 78 publications
(184 reference statements)
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“…The data at 6.9 K and 17.5 K were fitted independently to extract the values of D it . We found, D it = 3.2 × 10 17 cm −2 eV −1 at 6.9 K, which is several orders of magnitude higher compared to typical trap density at oxide surface [38,39]. However, considering an energy window of k B T , the number of activated trapped states, n I = 1.3 × 10 14 cm −2 , which matches with the number density of Coulomb traps n i = 1 × 10 14 cm −2 , extracted from the fitting of the σ-n ( Fig.…”
mentioning
confidence: 67%
“…The data at 6.9 K and 17.5 K were fitted independently to extract the values of D it . We found, D it = 3.2 × 10 17 cm −2 eV −1 at 6.9 K, which is several orders of magnitude higher compared to typical trap density at oxide surface [38,39]. However, considering an energy window of k B T , the number of activated trapped states, n I = 1.3 × 10 14 cm −2 , which matches with the number density of Coulomb traps n i = 1 × 10 14 cm −2 , extracted from the fitting of the σ-n ( Fig.…”
mentioning
confidence: 67%
“…The linearity of I − V characteristics (not shown) and temperature independence of R c (see Supplementary Figure 4) in our devices however eliminate the possibility of Schottky barrier-limited transport. An alternative source of time varying potential is the trapped charge at the SiO 2 surface [44,[58][59][60][61][62], which has been suggested to cause contact noise even in ballistic semiconducting carbon nanotubes FETs [6,63]. The reaction of graphene with metals spontaneously leads to chemical modification (e.g.…”
Section: Discussionmentioning
confidence: 99%
“…While the noise mag-nitude is determined by the fluctuating charge trap potential at the oxide substrate underneath the metal contacts, a simple phenomenological model unambiguously attributes the scaling to the current crowding effect at the metal-graphene junction. In view of the recent observations of contact noise [43,44] and current crowding effect in molybdenum disulphide (MoS 2 ) and black phosphorus FETs [26,27], many of the results and concepts developed in this paper can be extended to other members of 2D semiconductor family as well.…”
Section: Introductionmentioning
confidence: 98%
“…[16] with the ambipolar transport behaviors and many other TMD FETs [17][18][19][20] is further described as fluctuation of the carrier density. Finding a clear picture of the possible factors contributing to the 1/f noise, including the external adsorbates on the devices, [15] the defect states at the metal/TMD contacts, [17] and the trappingdetrapping centers in the substrate near the TMD channel, [18,21] remains a challenging issue because of the lack of Ohmic contacts, ideal material quality, and an effective control of the carrier density.…”
mentioning
confidence: 99%