Percolation analysis on free radical linear polymerization with instantaneous initiation

Park, Churl-Young; Ihm, Son‐Ki

doi:10.1007/bf00395577

Cited by 1 publication

(1 citation statement)

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“…For simulation of the dot fabrication, if the maximum monomer conversion-rate values in the final monomer conversion-rate map are lower than the threshold, all of the partially polymerized photo-resin is washed away, resulting in a zero feature size. Considering the percolation property of the polymer, the threshold of the monomer conversion-rate should be the critical point of the polymer percolation system [23]. The threshold also changes for photo-resins with different properties such as viscosity and monomer linking methods.…”

Section: Threshold Of Polymerizationmentioning

confidence: 99%

Dynamic modeling of superresolution photoinduced-inhibition nanolithography

Gan¹,

Jia²,

Gu³

2012

Opt. Express

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A dynamical model based on the photo-physics and photochemistry processes for superresolution photoinduced-inhibition nanolithography (SPIN) under both single-photon and two-photon excitation is developed and validated by experimental results. Numerical simulation results for the dot fabrication predict that the theoretical single dot size can be infinitely reduced, which shows diffraction-unlimited feature of the SPIN. A small reaction constant of the inhibitor polymerization is crucial to realize a small dot size and high resolution. It is discovered both theoretically and experimentally that the dot minimum size and best resolution occur under different inhibition beam powers because of the influence from the inhibitor polymerization. Moreover, due to the consumption of the photo-inhibitor molecules in the inhibition process, the dot size may vary during the sequential fabrication.

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Section: Threshold Of Polymerizationmentioning

confidence: 99%