2012
DOI: 10.1364/oe.20.016871
|View full text |Cite
|
Sign up to set email alerts
|

Dynamic modeling of superresolution photoinduced-inhibition nanolithography

Abstract: A dynamical model based on the photo-physics and photochemistry processes for superresolution photoinduced-inhibition nanolithography (SPIN) under both single-photon and two-photon excitation is developed and validated by experimental results. Numerical simulation results for the dot fabrication predict that the theoretical single dot size can be infinitely reduced, which shows diffraction-unlimited feature of the SPIN. A small reaction constant of the inhibitor polymerization is crucial to realize a small dot… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

1
12
0

Year Published

2012
2012
2021
2021

Publication Types

Select...
6
2

Relationship

3
5

Authors

Journals

citations
Cited by 20 publications
(13 citation statements)
references
References 24 publications
1
12
0
Order By: Relevance
“…The possibility to print on demand complex (micro)structures with high refractive index ( n ) and tailored bandgap can find interesting applications in the fields of optics, photonics, optical coatings, and telecommunications . There are many inorganic materials characterized by a high n that were successfully employed to create functional 3D structures via DLW (e.g., chalcogenide glasses, PbSe, and LiNbO 3 ), yet such materials will not be discussed in this review as the mechanism from which these structures are formed differ from multiphoton polymerizations.…”
Section: Nanocompositesmentioning
confidence: 99%
“…The possibility to print on demand complex (micro)structures with high refractive index ( n ) and tailored bandgap can find interesting applications in the fields of optics, photonics, optical coatings, and telecommunications . There are many inorganic materials characterized by a high n that were successfully employed to create functional 3D structures via DLW (e.g., chalcogenide glasses, PbSe, and LiNbO 3 ), yet such materials will not be discussed in this review as the mechanism from which these structures are formed differ from multiphoton polymerizations.…”
Section: Nanocompositesmentioning
confidence: 99%
“…Incorporation of super‐resolution fabrication with DLW has the potential to achieve fabrication feature sizes with deep‐subwavelength resolution . Recent work employing stimulated emission depletion (STED) DLW has approached a lateral resolution of 50 nm whereas a single‐photon photoinhibited polymerisation DLW has demonstrated a lateral resolution of 40 nm . Super‐resolution fabrication with DLW thus has the promise to realise dielectric nanostructures with resolution comparable to the e‐beam lithography.…”
Section: Electroless Metal Coatingmentioning
confidence: 99%
“…Multiphoton lithography is an ultimate approach to 3D nanofabrication, but lacks resolution below 100 nm ( 9 , 12 ). Here, using optical two-beam super-resolution lithography ( 21 , 22 ), we demonstrate that this recently developed technique can fabricate biomimetic photonic structures with superior resolution, uniformity, and controllability.…”
Section: Introductionmentioning
confidence: 99%