2005
DOI: 10.1063/1.1901819
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Peculiarities of electron emission from the cathode in an abnormal glow discharge

Abstract: Emissive properties of cold cathodes under the conditions of abnormal glow discharges are considered. Unlike the earlier made investigations, account is taken of alloying the surface layer by fast atoms generated in the cathode fall region. Atom implantation into the cathode to a depth of 10 nm changes the electron emission in a gas discharge radically as compared with vacuum conditions. Potential emission is reduced because of an increase in the surface work function. Kinetic emission is enhanced owing to an … Show more

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Cited by 28 publications
(18 citation statements)
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“…Attempts have been made to use this effective electron yield, calculated for a uniform electric field, to model also the cathode fall of abnormal glow discharge [40,46]. The failure of these attempts led to intense debate [39,40,44,46,48], recently clarified by Donkó and coworkers [39,44]. Using a hybrid model, they showed that the different electric field distributions result in dissimilar energy distributions of species bombarding the cathode, thereby modifying the effective electron yield.…”
Section: The Role Of Ion-induced Electron Emission In Glow Dischargesmentioning
confidence: 96%
“…Attempts have been made to use this effective electron yield, calculated for a uniform electric field, to model also the cathode fall of abnormal glow discharge [40,46]. The failure of these attempts led to intense debate [39,40,44,46,48], recently clarified by Donkó and coworkers [39,44]. Using a hybrid model, they showed that the different electric field distributions result in dissimilar energy distributions of species bombarding the cathode, thereby modifying the effective electron yield.…”
Section: The Role Of Ion-induced Electron Emission In Glow Dischargesmentioning
confidence: 96%
“…Other electron ejection processes from surfaces by fast neutrals, metastable atoms and VUV photons are also suggested to be important [13,26]. Bokhan and coauthors have worked on understanding photoemission, and potential, kinetic secondary electron emission under the influence of atom implantation in plasma devices [27][28][29].…”
Section: Introductionmentioning
confidence: 99%
“…The effects of the boundary conditions have recently been discussed by Hagelaar et al [32], while issues related to the secondary electron emission coefficient have been addressed in [14,16,17,33,34] (for low current, Townsend discharges these studies were preceded by [35,36]).…”
Section: Introductionmentioning
confidence: 99%