Patterning of Polymer Nanocomposite Resists Containing Metal Nanoparticles by Electron Beam Lithography

Lee, Byoung‐Min; Kang, Dongwoo; Jung, Chan-Hee; Choi, Jae‐Hak; Hwang, In-Tae; Hong, Sung–Kwon; Lee, Jae‐Suk

doi:10.1166/jnn.2011.4803

Cited by 5 publications

(5 citation statements)

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“…PVP used as a stabilizer for Ag NPs have been reported by Lee et al in patterning of a nanocomposite resist for electron beam lithography [200] . It is also used in synthesis of Ag NPs by gamma, electron beam, and synchrotron X-ray irradiation [201] .…”

Section: Lithography and Photographymentioning

confidence: 99%

Poly(vinylpyrrolidone) – A Versatile Polymer for Biomedical and Beyond Medical Applications

Teodorescu¹,

Bercea²

2015

Polymer-Plastics Technology and Engineering

371

222

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The high versatility of poly(vinylpyrrolidone) (PVP) can be explained by its diverse properties including its solubility in water and in a broad range of liquid media, high chemical and thermal resistance, and unique wetting, binding, and film-forming properties. Thanks to biocompatibility, absence of toxicity and high capacity to form interpolymer complexes, PVP is widely used for designing materials for different applications, such as biomaterials for medical and nonmedical uses. This review summarizes a vast diversity of applicative examples showing the tremendous opportunities for future research and developments of PVP based biomaterials.

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Section: Lithography and Photographymentioning

confidence: 99%

Poly(vinylpyrrolidone) – A Versatile Polymer for Biomedical and Beyond Medical Applications

Teodorescu¹,

Bercea²

2015

Polymer-Plastics Technology and Engineering

371

222

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“…Much less is known about how electrons interact with the water‐soluble polymer precursors often used in biorelevant patterning applications such as poly(ethylene glycol) [PEG], poly(vinyl pyrrolidone) [PVP], poly (acrylic acid) [PAA], or polyacrylimide . PEG films, for example, can be e‐beam processed to create surface‐patterned hydrogels that resist nonspecific protein adsorption and cell adhesion .…”

Section: Introductionmentioning

confidence: 99%

Poly(ethylene glycol) as a biointeractive electron‐beam resist

Wang

Firlar

Dai

et al. 2013

J Polym Sci B Polym Phys

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Poly(ethylene glycol) (PEG) can serve as an electron‐beam (e‐beam) resist to modulate protein adsorption on and cell adhesion to surfaces. PEG preferentially crosslinks under e‐beam irradiation to create microgels with controllable properties. Here, atomic‐force, scanning electron, and confocal microscopies are used to study discrete microgels formed from solvent‐cast PEG thin films by focused e‐beams with energies between 2 and 30 keV and point doses between 10 and 1000 fC. Consistent with experimental findings, Monte Carlo simulation of electron energy deposition identifies three structures within each microgel: a highly crosslinked core near the point of electron incidence; a lightly crosslinked near corona surrounding the core; and a far corona at the PEG–Si interface. The nature and relative sizes of these three regions and, hence, the microgel–protein interactions depend on the incident electron energy and dose. The far corona creates protein‐repulsive surface hundreds of nanometers or more from the microgel core. The highly crosslinked core is largely shielded by the near corona. These findings can help guide the choice of irradiation conditions to most effectively modulate protein–surface interactions via PEG microgels patterned by e‐beam lithography. © 2013 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2013, 51, 1543–1554

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“…Further reports demonstrate that if Ag or Au salts are added to polyvinyl alcohol, electron beam exposure can induce acid catalyzed crosslinking within polyvinyl alcohol rendering the exposed regions insoluble in water thus exhibiting negative-tone behavior 159 , 160 . The addition of silver nitrate to poly(vinyl pyrrolidone) also exhibited negative-tone pattern ability; however, it was found that the nanocomposite formulation showed lower patterning resolution 161 . Better results were obtained for a negative resist that consists of chloroauric acid (HAuCl4) and poly(vinyl pyrrolidone) hybrid, giving a minimum Au feature size of ∼100 nm after electron beam lithography 162 …”

Section: Metal-containing Resists In Electron Beam Lithography: An Ov...mentioning

confidence: 99%

“…159,160 The addition of silver nitrate to poly(vinyl pyrrolidone) also exhibited negative-tone pattern ability; however, it was found that the nanocomposite formulation showed lower patterning resolution. 161 Better results were obtained for a negative resist that consists of chloroauric acid (HAuCl 4 ) and poly(vinyl pyrrolidone) hybrid, giving a minimum Au feature size of ∼100 nm after electron beam lithography. 162 In a recent report, the addition of ∼2-nm-sized Ag nanoparticles to tert-butyl 2-ethyl-6-(4hydroxyphenyl)-4-phenylheptanoate (Terpolymer) resist served as radiation sensitizer.…”

Section: Metal-containing Polymeric Resistsmentioning

confidence: 99%

Review of metal-containing resists in electron beam lithography: perspectives for extreme ultraviolet patterning

Saifullah

Tiwale

Ganesan

2022

J. Micro/Nanopattern. Mats. Metro.

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Background: Metal-containing resists entered the mainstream semiconductor industry process flow to mitigate the low absorbance of extreme ultraviolet (EUV) radiation by thin films of organic resists that lead to poor sensitivity and their inability to handle rigors of development and etching conditions.Aim: The long and rich history of using metal-containing resists in electron beam lithography can offer interesting lessons, pointers, and insights to the relatively newcomer EUV lithography, which is slightly over a decade old.Approach: Electron beam lithography has been enjoying a considerable amount of freedom in the choice of resist materials for close to 50 years; especially the use of metal-containing resists to attain not only single digit nanometer resolution, higher sensitivity, and etch resistance but also lower line-edge roughness. Here, we make a comprehensive historical review of the progress made in the patterning of metal-containing resists in electron beam lithography and derive insights that can be potentially useful in EUV patterning.Perspectives: Small molecular weight resists are proven to be crucial for achieving higher resolution with low line-edge roughness. Simplifying process flow by reducing etch-stack-layers is conceivable with metal-containing resists, along with direct-patterning of functional materials for heterogeneous integration. Efficient contact hole patterning at tighter pitches may be incumbent on progress in positive-tone resist research.

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Patterning of Polymer Nanocomposite Resists Containing Metal Nanoparticles by Electron Beam Lithography

Cited by 5 publications

References 0 publications

Poly(vinylpyrrolidone) – A Versatile Polymer for Biomedical and Beyond Medical Applications

Poly(vinylpyrrolidone) – A Versatile Polymer for Biomedical and Beyond Medical Applications

Poly(ethylene glycol) as a biointeractive electron‐beam resist

Review of metal-containing resists in electron beam lithography: perspectives for extreme ultraviolet patterning

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