Patterning of metal oxide thin films using a H<sub>2</sub>/He atmospheric pressure plasma jet

Sener, M. Emre; Sathasivam, Sanjayan; Palgrave, Robert G.; Quesada-Cabrera, Raúl; Caruana, Daren J.

doi:10.1039/d0gc00080a

Cited by 19 publications

(11 citation statements)

References 46 publications

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“…Finally, by reducing the SALD head in size and implementing concentric circular gas outlets, a SALD pen has been designed and printed that allows the open-air printing of functional materials. While the proof of concept presented here is limited to several millimeters in lateral resolution, a further miniaturization of the SALD pen through optimized engineering should allow a finer lateral resolution, down to the micron scale, [55,56] thus allowing the deposition of patterns with more similar scales in the three dimensions. The same applies to the other ASD strategies proposed here.…”

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confidence: 99%

Gas‐Phase 3D Printing of Functional Materials

Huerta

Nguyễn

Sekkat

et al. 2020

Adv Materials Technologies

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Furthermore lithography and patterning are often performed in cleanrooms, thus adding to the cost of the final devices. In this context, there have been much progress in bringing the resolution of inkjet printing down to the micrometer level. [6] And other new bottom-up strategies are being developed, for example based on microfluidics and interfacial convective assembly. [7,8] Another new approach to so-called area-selective deposition (ASD) has been developed in the last years in the field of atomic layer deposition (ALD). [3,9] In ALD, solid-gas, surface-limited, selfterminating reactions take place. [10-12] This results in very compact and continuous thin films with a sub-nanometer thickness control and unique conformality, key assets for engineering the interfaces and surfaces of different functional materials and devices. [13-16] Given the surface-limited nature of ALD, several strategies can be implemented to control the reactivity of ALD precursors toward different surfaces to generate selectivity and result in ASD. These involve the use of a substrate with different materials (growth inhibition or delay taking place in one of them) or the use of self-assembled monolayers to block the growth in certain parts of the surface, as recently reviewed by Mackus et al. [17] While these approaches are very appealing and have proven to be efficient, there is still the need to have a surface with different materials, and in most cases a prepatterning step is necessary. Also, some of the ASD approaches require intermediate etching steps. [18] Finally, these approaches suffer from the inherent low deposition rate of ALD and the use of expensive vacuum equipment. In the last years, spatial ALD (SALD) has established itself as a high-throughput, low-cost alternative to conventional ALD. SALD is based on the spatial separation of precursors, as opposed to the sequential (temporal) separation in ALD. [19,20] Thus, precursors are continuously injected in different locations, which are spatially separated by an inert gas region. As the sample is exposed to the different regions, the standard ALD cycle is reproduced. Because no purge steps are needed, SALD can be up to two orders of magnitude faster than ALD. [21,22] In addition, SALD can be performed at atmospheric pressure (AP-SALD), thus resulting more convenient for scalingup than vacuum-based ALD. [23-25] But because SALD is based on the same surface-limited, self-terminating chemistry than Spatial atomic layer deposition (SALD) is a recent approach 100 times faster than conventional atomic layer deposition (ALD), even at atmospheric pressure. Previous works exploited these assets focussing on high-rate, large-area deposition for scaling-up into mass production. Conversely, this work shows that SALD indeed represents an ideal platform for area-selective deposition of functional materials by proper design and miniaturization of close-proximity SALD heads. In particular, the potential offered by 3D printing is used to fabricate low-cost customized close-proximity heads, w...

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confidence: 99%

Gas‐Phase 3D Printing of Functional Materials

Huerta

Nguyễn

Sekkat

et al. 2020

Adv Materials Technologies

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“…As shown in Figure , the binding energies at 399.5, 398.5, and 400.1 eV were attributed to N from tertiary, secondary, and primary amine functionality of pristine PEI (Figure a). , After the formation of the coacervate, a new binding energy at 401.0 eV that corresponded to protonated amine groups (−NH 3+ ) appeared, indicating that the primary amines were protonated efficiently (Figure b) . It is worth noting that part of W elements in PW 12 were deducted from 6 + to 5 + upon the formation of the coacervate (Figure c,d). − This valence change led to the transition from PW 12 O 40 3– to PW 12 O 40 4– , thus further increasing the electrostatic interaction between PW 12 and PEI and further enhancing the viscosity of the coacervate. Nevertheless, the PEI-PW 12 coacervate was almost electroneutral as evidenced by zeta potential characterization (Figure S5).…”

Section: Results and Discussionmentioning

confidence: 76%

A Universal and Reversible Wet Adhesive via Straightforward Aqueous Self-Assembly of Polyethylenimine and Polyoxometalate

Cui

Yin

Sun

et al. 2021

ACS Appl. Mater. Interfaces

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The excellent adhesion of mussels under wet conditions has inspired the development of numerous catechol-based wet adhesives. Nevertheless, the performance of catechol-based wet adhesive suffers from the sensitivity toward temperature, pH, or oxidation stimuli. Therefore, it is of great significance to develop non-catechol-based wet adhesives to fully recapitulate nature’s dynamic function. Herein, a novel type of non-catechol-based wet adhesive is reported, which is readily formed by self-assembly of commercially available branched polyethylenimine and phosphotungstic acid in aqueous solution through the combination of electrostatic interaction and hydrogen bonding. This wet adhesive shows reversible, tunable, and strong adhesion on diverse substrates and further exhibits high efficacy in promoting biological wound healing. During the healing of the wound, the as-prepared wet adhesive also possesses inherent antimicrobial properties, thus avoiding inflammations and infections due to microorganism accumulation.

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“…1a and b) was generated at a tungsten pin electrode inserted coaxially into a glass capillary or an alumina tube, as described elsewhere. 20 Briefly, the electrode is driven by a radio frequency generator operating at 13.56 MHz and 10 W, the driving signal is pulse-width modulated at 30 kHz, 15% duty cycle to minimise the thermal load on the samples. The driving signal is passed through a matching network tuned to match the high impedance plasma load to the 50 Ω output of the generator.…”

Section: Methodsmentioning

confidence: 99%

Facile formation of black titania films using an atmospheric-pressure plasma jet

et al. 2022

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Patterning of metal oxide thin films using a H₂/He atmospheric pressure plasma jet

Abstract: Localised and directional micro-scale reduction of metal oxide surfaces, using a hydrogen-doped helium atmospheric pressure plasma jet.

Cited by 19 publications

References 46 publications

Gas‐Phase 3D Printing of Functional Materials

Gas‐Phase 3D Printing of Functional Materials

A Universal and Reversible Wet Adhesive via Straightforward Aqueous Self-Assembly of Polyethylenimine and Polyoxometalate

Facile formation of black titania films using an atmospheric-pressure plasma jet

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Patterning of metal oxide thin films using a H2/He atmospheric pressure plasma jet

Abstract: Localised and directional micro-scale reduction of metal oxide surfaces, using a hydrogen-doped helium atmospheric pressure plasma jet.

Cited by 19 publications

References 46 publications

Gas‐Phase 3D Printing of Functional Materials

Gas‐Phase 3D Printing of Functional Materials

A Universal and Reversible Wet Adhesive via Straightforward Aqueous Self-Assembly of Polyethylenimine and Polyoxometalate

Facile formation of black titania films using an atmospheric-pressure plasma jet

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Patterning of metal oxide thin films using a H₂/He atmospheric pressure plasma jet