2008
DOI: 10.1021/ja806952j
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Patterned Growth of Vertically Aligned ZnO Nanowire Arrays on Inorganic Substrates at Low Temperature without Catalyst

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Cited by 284 publications
(262 citation statements)
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“…Due to a small lattice mismatch, almost perfectly vertically aligned ZnO nanowire arrays can be grown on GaN (n-type [48] and p-type [145][146][147][148][149]), AlN, SiC, Al 2 O 3 , and MgAl 2 O 4 substrates [150], either by hydrothermal decomposition [151] or electrodeposition. In particular, ZnO and GaN have the same wurtzite-type structure with a low lattice mismatch of 1.8% [152], which is much smaller than that (12.7%) with Au(111).…”
Section: N-gan/p-ganmentioning
confidence: 99%
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“…Due to a small lattice mismatch, almost perfectly vertically aligned ZnO nanowire arrays can be grown on GaN (n-type [48] and p-type [145][146][147][148][149]), AlN, SiC, Al 2 O 3 , and MgAl 2 O 4 substrates [150], either by hydrothermal decomposition [151] or electrodeposition. In particular, ZnO and GaN have the same wurtzite-type structure with a low lattice mismatch of 1.8% [152], which is much smaller than that (12.7%) with Au(111).…”
Section: N-gan/p-ganmentioning
confidence: 99%
“…Since photolithography has a bottleneck arising from the diffraction limit of UV light, a combination of electron beam lithography and a wet chemical growth method has been developed [48]. Electrons are accelerated by tens of kilovolts and have a wavelength on the order of Ångstroms, which gives a much higher resolution than conventional photolithography [274].…”
Section: Electron Beam Lithographymentioning
confidence: 99%
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“…We trimmed the SC/40 database by deleting seven of the semiconductors for which there are no experimental values for either the lattice constant, the bandgap, or both and three semiconductors for which we had serious difficulties in obtaining converged self-consistent field solutions, even using a very high number of k points. This leaves 30 semiconductors, to which we added ZnO data 32,33 because of its importance in applications, [34][35][36][37][38] and strong theoretical interest, [39][40][41][42][43] for a total of 31 semiconductors. We then created two databases, SLC34 with 34 semiconductor lattice constants and SBG31 with 31 semiconductor bandgaps.…”
Section: Test Set and Computational Detailsmentioning
confidence: 99%
“…to remove the metal catalyst particles completely after the tube production process [23]. The metal catalyst residues are incompatible with silicon semiconductor technology [24], thus hampering the use of carbon nanotubes in electronics. In many cases, the catalyst particles are covered by a carbon shell, which imposes additional problems for the non-destructive purification of carbon nanotubes such as by treatment with non-oxidizing acids, etc.…”
Section: Introductionmentioning
confidence: 99%