Passivation Kinetics of 1,2,4-Triazole in Copper Chemical Mechanical Polishing

Jiang, Liang; He, Yongyong; Li, Jing

doi:10.1149/2.0171605jss

Cited by 19 publications

(9 citation statements)

References 47 publications

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“…[16][17][18][19][20][21] However, BTA is toxic and slightly soluble in water and the chemisorbed BTA molecules film removal needs strong mechanical force, which may cause severe damage to the fragile copper damascene structure. 22 Hence some other environment-friendly inhibitors have been researched and introduced to slurry. 1,2,4-triazole, as a low-toxicity and high soluble corrosion inhibitor, is an aromatic heterocycle and widely used as intermediate for synthesizing agricultural fungicide, plant growth regulators and pharmaceutical applications.…”

mentioning

confidence: 99%

Role of 1,2,4-Triazole in Co/Cu Removal Rate Selectivity and Galvanic Corrosion during Barrier CMP

Zhang

Liu

Wang

et al. 2017

ECS J. Solid State Sci. Technol.

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Removal rate selectivity control and galvanic corrosion reduction between cobalt (Co) and copper (Cu) are two challenges during cobalt barrier chemical mechanical polishing process in copper interconnects. This paper focuses on the investigation of a typical inhibitor 1,2,4-triazole on Co/Cu removal rate selectivity and galvanic corrosion under alkaline conditions. It is revealed that the selectivity of cobalt removal to copper is improved by accelerating the cobalt removal at low 1,2,4-triazole concentration, and then the removal rate of both metals is inhibited as 1,2,4-triazole further increased at 0.5 wt% colloidal silica concentration. Based on results, the inhibition action of 1,2,4-triazole was proposed. 1,2,4-TAH and 1,2,4-TA − species exist and account for at pH 10, then physical adsorption between 1,2,4-TAH and copper or cobalt atom via N4 site and chemical adsorption between 1,2,4-TA − and metal cation by sharing nitrogen atoms with a free electron pair in triazole ring occur on the two metals surface, resulting in copper and cobalt inhibited. The corrosion inhibition efficiency (IE) and corrosion potential difference ( E) was obtained from the potentiodynamic polarization plots. The results indicate that 1,2,4-triazole is an effective inhibitor both for chemical and galvanic corrosion.

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mentioning

confidence: 99%

Role of 1,2,4-Triazole in Co/Cu Removal Rate Selectivity and Galvanic Corrosion during Barrier CMP

Zhang

Liu

Wang

et al. 2017

ECS J. Solid State Sci. Technol.

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“…Effect of K 2 SO 4 on the corrosion of 18CrNiMo7-6 steel.-In principle, metal CMP is a nanoscale corrosive wear process. 37,38 The total MRR in CMP can be composed of the following four parts: 37,39 As shown in Fig. 3, for the basic slurry containing only silica abrasive, adding K 2 SO 4 does not raise the MRR, implying that K 2 SO 4 cannot enhance wear.…”

Section: Resultsmentioning

confidence: 99%

Enhancing Chemical Mechanical Polishing Efficiency of Steel with Sulfate

Zhang,

Peng,

Jiang

et al. 2023

ECS J. Solid State Sci. Technol.

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Excellent surface quality helps improve the tribological performance of gears. This study utilized chemical mechanical polishing (CMP) to process 18CrNiMo7-6 steel, a widely-used gear material. The results reveal that under the cooperative effect of oxidation and complexation, the material removal rate (MRR) can be significantly enhanced after adding K2SO4, while the surface roughness Sa nearly remains unaltered. In particular, with 1 wt% H2O2 and citrate, the MRR increases by 251% after adding 100 mM K2SO4, while the Sa slightly varies to 0.42 nm. No distinct surface defects are generated. For the mechanism, adding SO42- can promote iron corrosion and increase the amount of α-FeOOH. Citric acid can chelate α-FeOOH, forming complex compounds. The complex compounds and oxides form a relatively dense surface film, and thus the surface quality remains unchanged. In addition, the complex compounds may weaken the surface, and thereby the MRR increases. This study provides a simple approach for achieving high-efficiency CMP of steels.

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“…It should be put forward that, by referring to the related literatures [23][24][25], the following discussion mainly focuses on the chemical and electrochemical reactions of iron since it accounts for approximately 96 wt% of GCr15 steel according to the national standard. The total MRR in CMP can be decomposed into the following four parts [26][27][28][29]: the MRR by the pure wear, the MRR by the corrosion-enhanced wear, the MRR by the pure corrosion, the MRR by the wear-enhanced corrosion. Specifically, the MRR by the corrosion-enhanced wear is mainly attributed to the modification of the mechanical strength of the surface film by slurries, especially by the complexing agent [29][30][31].…”

Section: Characterization Of the Surface Film Of Gcr15 Steel Formed Bmentioning

confidence: 99%

“…The total MRR in CMP can be decomposed into the following four parts [26][27][28][29]: the MRR by the pure wear, the MRR by the corrosion-enhanced wear, the MRR by the pure corrosion, the MRR by the wear-enhanced corrosion. Specifically, the MRR by the corrosion-enhanced wear is mainly attributed to the modification of the mechanical strength of the surface film by slurries, especially by the complexing agent [29][30][31]. In this study, the pure corrosion and the corrosion-enhanced wear caused by -NH 2 functional groups of ethylenediamine were emphatically investigated by using static etching, electrochemical and AFM wear experiments collectively.…”

Section: Characterization Of the Surface Film Of Gcr15 Steel Formed Bmentioning

confidence: 99%

Exploring the role of −NH2 functional groups of ethylenediamine in chemical mechanical polishing of GCr15 bearing steel

Jiang

Zhong

et al. 2020

Friction

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Ethylenediamine with two −NH2 functional groups was used as a critical complexing agent in chemical mechanical polishing (CMP) slurries for a high carbon chromium GCr15 bearing steel (equivalent to AISI 52100). The polishing performance and corresponding mechanism of −NH2 functional groups were thoroughly investigated as a function of pH. It is revealed that, when polished with ethylenediamine and H2O2-based slurries, the material removal rate (MRR) and surface roughness Ra of GCr15 steel gradually decrease as pH increases. Compared with acidic pH of 4.0, at alkaline pH of 10.0, the surface film of GCr15 steel has much higher corrosion resistance and wear resistance, and thus the material removal caused by the pure corrosion and corrosion-enhanced wear are greatly inhibited, resulting in much lower MRR and Ra. Moreover, it is confirmed that a more protective composite film, consisting of more Fe3+ hydroxides/oxyhydroxides and complex compounds with −NH2 functional groups of ethylenediamine, can be formed at pH of 10.0. Additionally, the polishing performance of pure iron and a medium carbon 45 steel exhibits a similar trend as GCr15 steel. The findings suggest that acidic pH could be feasible for amine groups-based complexing agents to achieve efficient CMP of iron-based metals.

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Passivation Kinetics of 1,2,4-Triazole in Copper Chemical Mechanical Polishing

Cited by 19 publications

References 47 publications

Role of 1,2,4-Triazole in Co/Cu Removal Rate Selectivity and Galvanic Corrosion during Barrier CMP

Role of 1,2,4-Triazole in Co/Cu Removal Rate Selectivity and Galvanic Corrosion during Barrier CMP

Enhancing Chemical Mechanical Polishing Efficiency of Steel with Sulfate

Exploring the role of −NH2 functional groups of ethylenediamine in chemical mechanical polishing of GCr15 bearing steel

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