2016
DOI: 10.1002/pip.2852
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Passivation at the interface between liquid‐phase crystallized silicon and silicon oxynitride in thin film solar cells

Abstract: The passivation quality at the interface between liquid-phase crystallized silicon (LPC-Si) and a dielectric interlayer (IL) was investigated in terms of the defect state density at the IL/LPC-Si interface (D it ) as well as the effective fixed charge density in the IL (Q IL,eff ). Both parameters were obtained via high-frequency capacitance-voltage measurements on developed metal-insulator-semiconductor structures based on a molybdenum layer sandwiched between the IL and the glass substrate. D it and Q IL,eff… Show more

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Cited by 9 publications
(7 citation statements)
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References 39 publications
(64 reference statements)
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“…For the doping series, 15 µm and for the thickness variation 14 and 33 µm of nominally intrinsic Si were deposited on 1.1 mm Corning Eagle XG glass using high rate electron beam evaporation. Prior to Si deposition a multifunctional intermediate layer (IL) comprised of SiOx/SiNx/SiOx was deposited as described elsewhere [12,13,16]. Amongst others, this IL is crucial for final device performance, since it is the only option to control the passivation and stop impurity diffusion at the glass/LPC-Si interface because later this interface is buried and inaccessible.…”
Section: Methodsmentioning
confidence: 99%
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“…For the doping series, 15 µm and for the thickness variation 14 and 33 µm of nominally intrinsic Si were deposited on 1.1 mm Corning Eagle XG glass using high rate electron beam evaporation. Prior to Si deposition a multifunctional intermediate layer (IL) comprised of SiOx/SiNx/SiOx was deposited as described elsewhere [12,13,16]. Amongst others, this IL is crucial for final device performance, since it is the only option to control the passivation and stop impurity diffusion at the glass/LPC-Si interface because later this interface is buried and inaccessible.…”
Section: Methodsmentioning
confidence: 99%
“…Different final doping concentrations were achieved by varying the phosphine gas flow during deposition. The actual liquid phase crystallization procedure was performed using a line-shaped laser at a wavelength of 808 nm in vacuum [12]. The absorber is molten entirely, allowing the dopants in the doping layer to disperse homogeneously throughout the absorber.…”
Section: Methodsmentioning
confidence: 99%
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“…The capacitance across the structure varies with applied voltage which is dedicated to the behavior of the semiconductor space charge layer at the IL/LPC‐Si interface. Previously, we applied this method successfully to demonstrate that defect states at the interface between N/O/ON IL stacks and LPC‐Si are reduced strongly when a postdeposition hydrogen plasma treatment is performed …”
Section: Introductionmentioning
confidence: 99%
“…Recently, the material quality of such polycrystalline silicon (pc‐Si) became comparable with conventional multicrystalline wafers, e.g., indicated by high open circuit voltages of the prepared solar cells . Solar conversion efficiencies up to 13.2% were demonstrated . Moreover, the high temperature load due to the laser treatment is very close to the sample surface and rests only for some milliseconds which facilitate the use of low cost glasses as substrates.…”
Section: Introductionmentioning
confidence: 99%