2020
DOI: 10.35848/1347-4065/ab72ca
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Particle formation during deposition of SiO x nanostructured thin films by atmospheric pressure plasma jet

Abstract: In this work, the results of SiO x thin film deposition by an atmospheric pressure plasma jet using HMDSO (hexamethyldisiloxane) as precursor are presented. The experiments were performed for different process parameters like initial applied power, substrate to nozzle distance and speed of the moving substrate holder. In order to determine the properties of deposited films the samples were analyzed by scanning electron microscopy, transmission electron microscopy, atomic force microscopy and profilometer. The … Show more

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Cited by 16 publications
(7 citation statements)
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References 54 publications
(71 reference statements)
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“…The approach benefits from the other unique assets of ALD, namely, conformality, density, and compactness of the deposited films, and high material quality at low deposition temperature. This is important when comparing with other deposition systems based on spray coating or plasma aerosol jets that are based on CVD reactions, [ 54 ] which yield less homogeneous thin films. Figure 4e shows an image of our 3D printed SALD pen installed in a 3D table, used in this case to directly print a circle of ZnO without any previous patterning step.…”
Section: Figurementioning
confidence: 99%
“…The approach benefits from the other unique assets of ALD, namely, conformality, density, and compactness of the deposited films, and high material quality at low deposition temperature. This is important when comparing with other deposition systems based on spray coating or plasma aerosol jets that are based on CVD reactions, [ 54 ] which yield less homogeneous thin films. Figure 4e shows an image of our 3D printed SALD pen installed in a 3D table, used in this case to directly print a circle of ZnO without any previous patterning step.…”
Section: Figurementioning
confidence: 99%
“…The SiO 2 ultra-thin layer (of 10-20 nm) was deposited on the top of samples using the commercial atmospheric pressure plasma jet PFW 10 (Plasmatreat GmbH, Steinhagen, Germany) and hexamethyldisiloxane www.advmattechnol.de (HMDSO) as precursor similar as in other works. [63][64][65][66] The jet parameters were 300 V primary voltage, 19 kHz discharge frequency, and a plasma cycle time of 100%, which corresponds to a duty cycle of 50%. As working gas, 30 slm pressured air was used, and 1 slm N 2 (Air Liquide, 99.995% purity) was bubbled through the liquid HMDSO (Merck KGaA, GC, area% ≥ 98.5 area%).…”
Section: Methodsmentioning
confidence: 99%
“…VBD consists of two parallel dielectric plates with electrodes mounted externally or two electrodes on one side of the dielectric. SBD device has a dielectric surface with a small but elongated electrode on one side of the dielectric and a metallic electrode coated on the opposite side [5,6]. Such devices are advantageous for industrial use because vacuum equipment can be avoided and DBD-based devices operate in the atmospheric pressure range.…”
Section: Introductionmentioning
confidence: 99%