Partially reactive d.c. magnetron sputtering — a key to new understanding of reactive plasma sputter deposition?

Sobe, G.

doi:10.1016/0257-8972(95)08342-1

Cited by 5 publications

(1 citation statement)

References 12 publications

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“…To meet the needs of thin film development, the model is also not intended to require detailed information on the electron energy distribution function (EEDF). It still must help to explain the dependences of the rates of formation of excited and ionic species on discharge current and chamber pressure, which is known to be one of the most crucial parameters [18,19]. To evaluate the model presented here, the experiments deal with the well-known sputtering of aluminium with argon and use OES to investigate excitation processes.…”

Section: Introductionmentioning

confidence: 99%

A Linear Model for the Interpretation of Optical Emission Spectroscopy Measurements in Low Pressure DC Magnetron Sputtering

Schulte

Sobe

Reiss

1997

Contrib. Plasma Phys.

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For a balanced dc magnetron discharge a linear model for the formation of excited and ionized species is presented. The consideration is based on collisional kinetic theory and a correlation of discharge current with ionization rates, and leads to normalized rate coefficients. The electron energy distribution changes according to the determining external parameters, but needs neither to be known in detail nor to be of Maxwellian type.The model calculations are consistent with measurements done by optical emission spectroscopy (OES) on the magnetron sputtering of aluminium in argon discharges. The dependences of optical emission intensities on discharge current and on argon pressure show that both, excited argon atoms as well as excited argon ions, are generated from neutral argon by direct, fast electron impact. It is additionally shown that a t least for low argon pressure the excitation of aluminium atoms is also caused by direct electron impact.

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Section: Introductionmentioning

confidence: 99%