Properties of reactively RF magnetron-sputtered chromium nitride coatings

Bertrand, Ghislaine; Savall, C.; Meunier, C.

doi:10.1016/s0257-8972(97)00184-9

Cited by 91 publications

(45 citation statements)

References 18 publications

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“…Thereafter, it decreases more slowly but also linearly to around 1.5 nm/ min at 100% N 2 . Dependencies of the deposition rate versus the reactive gas fraction showing an initial rapid decrease followed by a more gradual one have been observed in other material systems such as TaN, 21 TiN, 22 RuO 2 , 23 and CrN/Cr 2 N. 24 The rapid drop is usually ascribed to the formation of a layer of compound on the target. For sputtered GaN films, Ross and Rubin 25 observed an almost identical dependence to this experiment at 1.22 Pa, including a knee in the data at 65% N 2 .…”

Section: Nitrogen Fraction Dependencementioning

confidence: 71%

The properties and deposition process of GaN films grown by reactive sputtering at low temperatures

Knox-Davies

Shannon

Silva

2006

Journal of Applied Physics

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Polycrystalline gallium nitride films, 100 nm to 1 m thick, were deposited under a range of conditions. Substrate electrode temperatures during sputtering were varied from room temperature to 450°C, the pressure from 0.15 to 6.0 Pa, the nitrogen fraction of the deposition atmosphere from 10% to 100% and the target bias from −400 to − 1800 V. The deposition rates as functions of these conditions are in the range 0.5-25 nm/ min. The growth rate is considered to be controlled respectively by the thermally activated desorption from the substrate, changes in the mean free path and concentration of gas particles, differences between the sputter yields of Ga and GaN in Ar and N 2 , and changes in the ion current and sputter yields. The films are generally columnar, with the grain size increasing with film thickness. The most crystalline films were grown at mid range temperatures, low N 2 concentrations, and low target biases, and the most disordered were grown at low pressures. The latter two cases suggest that decreasing the energy of particles incident on the film during deposition results in a more ordered film. The biaxial stress is compressive and shows an increasing trend with the target bias and N 2 concentration, reaching 4.7 GPa at 75% N 2 . Oxygen contamination of 3 -30 at. % has a major effect on the optical properties of the films, increasing the band gap values from 3.02 to Ͼ 4.0 eV and the Urbach tail energies from around 150 to 840 meV and decreasing the refractive index from 2.46 to 2.03. At a 40% N 2 deposition fraction, the N:Ga ratio is more or less constant at 1:1. Since the absolute oxygen incorporation rate changes very little, it is the relative film deposition rate which determines the final oxygen concentration. Excess Ga at low N 2 concentrations causes a decrease in the band gap and an increase in the Urbach tail energy.

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Section: Nitrogen Fraction Dependencementioning

confidence: 71%

The properties and deposition process of GaN films grown by reactive sputtering at low temperatures

Knox-Davies

Shannon

Silva

2006

Journal of Applied Physics

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“…A further increase in the N2 content may lead to increased amorphosization in the film. Bertrand et al [37] noted that the hardness is affected by a number of factors, including the stresses developed, cryatallographic orientation and direction, grain size and density. …”

Section: Effect Of the N2 Contentmentioning

confidence: 99%

Structural and mechanical characterisation of the chromium nitride hard coating deposited on the silicon and glass substrate

Shah¹

2017

Int. J. Automot. Mech. Eng.

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Chromium Nitride (CrN) thin films are known for their comparatively good mechanical properties. CrN was deposited on Silicon (100) and glass substrates by using DC magnetron sputtering and the influence of the partial nitrogen content and different gaseous environment on their microstructural characteristics were investigated in the present work. The CrN films were characterised with X-Ray Diffraction (XRD), Field Emission Scanning Electron Microscopy (FE-SEM), Atomic Force Microscopy (AFM) and Nanoindentation was used to characterise the structural and mechanical properties of the deposited thin film. The films showed the [200] preferred orientation at lower (at 20%) nitrogen contents while the intensity of the peak [111] increases with the increase in the nitrogen content. The Cr2N (220) peak was identified at a nitrogen content above 30%, but for nitrogen content above 40%, the CrN phase was observed in both films deposited on Si(100) and glass substrates. The preferred orientations of the CrN thin films are strongly influenced by the nitrogen content inside the chamber as observed in the present work. The surface roughness and deposition rate were observed in a reducing trend with the increasing N2 content and temperature from 20.31 to 2.71nm and from 30.16 nm/min to 25.66nm/min, respectively. The hardness and modulus of pure N2 films deposited on the Si substrates were evaluated by nanoindentaion testing and indicated 31 GPa and 250 GPa, respectively.

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“…Hybrid material systems consisting of one hard and one relatively soft phase have attracted considerable attention in the design of hard, yet tough, coatings [3][4][5][6][7][8]. For example, M 1 N-M 2 systems, where M 1 N represents hard transition metal nitrides e.g.…”

Section: Introductionmentioning

confidence: 99%

“…CrN-Ni coatings can be prepared relatively easily by reactive magnetron sputtering using a Ni-Cr alloy target in a nitrogen reactive gas environment [3,4]. Due to the low permeability of Ni to nitrogen [3,9], chromium tends to form stable nitrides (CrN and Cr 2 N) more readily [3,6,9]. In addition, Ni is insoluble in stoichiometric CrN [3,9].…”

Section: Introductionmentioning

confidence: 99%

Enhancing toughness of CrN coatings by Ni addition for safety-critical applications

Munroe

Jiang

et al. 2014

Materials Science and Engineering: A

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CrN is one of the most important transition metal nitrides, used as protective and anti-wear coating in modern engineering applications. However, CrN coatings are typically brittle and susceptible to catastrophic failure. In this paper, CrNiN coatings with differing Ni contents were deposited on tool steel substrates using a closed field unbalanced magnetron sputtering system. The effects of Ni addition on the microstructure and mechanical characteristics of CrN thin films were studied by combining nanoindentation tests with cross-sectional transmission electron microscopy. A columnar structure was observed in the CrN coating. With an increase in Ni content, the resultant columnar grains exhibited a high aspect ratio. Ni additions to CrN were

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Properties of reactively RF magnetron-sputtered chromium nitride coatings

Cited by 91 publications

References 18 publications

The properties and deposition process of GaN films grown by reactive sputtering at low temperatures

The properties and deposition process of GaN films grown by reactive sputtering at low temperatures

Structural and mechanical characterisation of the chromium nitride hard coating deposited on the silicon and glass substrate

Enhancing toughness of CrN coatings by Ni addition for safety-critical applications

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