Partial decarboxylation of hafnium oxide clusters for high resolution lithographic applications

Abstract

This work shows great influence on the EUV performance of hafnium carboxylate clusters via slightly structural modification. Treatment of hexameric hafnium clusters Hf6O4(OH)4(RCO2)12 (R = i-alkyl) with LiOH in DCM/water...

Nonchemically Amplified Molecular Resists Based on Sulfonium-Functionalized Sulfone Derivatives for Sub-13 nm Nanolithography

“…Numerous non-CARs based on self-immolative polymers like poly­(olefin sulfones), polyesters, and polyacetals, – metal-containing clusters, – metal–organic complexes, – and thiol–ene click reaction, have been developed and studied extensively in recent years, achieving patterns with line widths down to 4 nm. Moreover, novel non-CARs based on copolymers containing a radiation-sensitive sulfonium functionality have been reported.…”

Highly hydroxylated hafnium clusters are accessible to high resolution EUV photoresists under small energy doses

“…Hafnium oxide photoresists are the best-studied clusters for the development of negative-tone EUV photoresists. Hf 6 O 4 (-OH) 4 (RCO 2 ) 12 clusters 6,13,23 were selected as the platform (see Scheme 2). Our desired EUV photoresists are to avoid a radical chain aggregation; a MAA ligand is now replaced with 2-methylbutyrate.…”

Synthesis of pentameric chlorotin carboxylate clusters for high resolution EUV photoresists under small doses

“…Existing reports on metal clusters or nanoparticles predominantly feature oxide or carboxylate ligands owing to their ready availability. [6][7][8][9][10][11][12][13][14][15][16][17][18][19][20][21][22][23][24][25] However, oxide ligands exhibit photochemical inertness toward UV light in addition to their weak EUV absorptions. Although carboxylate ligands can be easily decomposed by EUV light, their sizes are somehow too large to facilitate the molecular aggregation of negative-tone photoresists.…”