Blatter radical derivatives
are very attractive due to their potential
applications, ranging from batteries to quantum technologies. In this
work, we focus on the latest insights regarding the fundamental mechanisms
of radical thin film (long-term) degradation, by comparing two Blatter
radical derivatives. We find that the interaction with different contaminants
(such as atomic H, Ar, N, and O and molecular H2, N2, O2, H2O, and NH2) affects
the chemical and magnetic properties of the thin films upon air exposure.
Also, the radical-specific site, where the contaminant interaction
takes place, plays a role. Atomic H and NH2 are detrimental
to the magnetic properties of Blatter radicals, while the presence
of molecular water influences more specifically the magnetic properties
of the diradical thin films, and it is believed to be the major cause
of the shorter diradical thin film lifetime in air.