Parameters affecting pattern fidelity and line edge roughness under diffraction effects in optical maskless lithography using a digital micromirror device

Seo, Manseung; Lee, Taehyoung; Kim, Haeryung

doi:10.1117/12.2000855

Cited by 1 publication

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“…9 In MPLS, light sources are generally laser diode or high pressure mercury lamps filtered by a narrow bandpass filter. 10 Evaluation of the diffraction efficiency is used to predict the exposure doses. 10 Evaluation of the diffraction efficiency is used to predict the exposure doses.…”

Section: Introductionmentioning

confidence: 99%

“…8 Because of the periodical configuration and the coherence of the light source, the irradiance of the DMD is influenced by diffraction effects. 9 Even though several researchers have investigated DMD's diffraction, [9][10][11][12][13][14] there are still several issues which have not been fully understood. 9 Even though several researchers have investigated DMD's diffraction, [9][10][11][12][13][14] there are still several issues which have not been fully understood.…”

Section: Introductionmentioning

confidence: 99%

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Diffraction analysis of digital micromirror device in maskless photolithography system

Xiong

Lü

Tan

et al. 2014

J. Micro/Nanolith. MEMS MOEMS

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A digital micromirror device (DMD) acts as a spatial light modulator in a maskless photolithography system. Illuminated by coherent light, DMD performs as a two-dimensional diffraction grating because of its periodical internal structure. Diffraction efficiency is an important factor for evaluating the exposure doses. A diffraction model of DMD based on Fourier analysis demonstrates that errors of the DMD's manufacture and the precision of the machining of the optical mechanical structure affect the diffraction efficiency. Additionally, analysis of exposure results by the diffraction model of DMD in Tracepro explains the degradation of the exposure quality and is helpful for calibrating the direction of optical focusing.

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Section: Introductionmentioning

confidence: 99%