2014
DOI: 10.1117/1.jmm.13.4.043016
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Diffraction analysis of digital micromirror device in maskless photolithography system

Abstract: A digital micromirror device (DMD) acts as a spatial light modulator in a maskless photolithography system. Illuminated by coherent light, DMD performs as a two-dimensional diffraction grating because of its periodical internal structure. Diffraction efficiency is an important factor for evaluating the exposure doses. A diffraction model of DMD based on Fourier analysis demonstrates that errors of the DMD's manufacture and the precision of the machining of the optical mechanical structure affect the diffractio… Show more

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Cited by 17 publications
(6 citation statements)
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“…In this work, we report the design and printing of customized DOEs on synthetic PEGDA hydrogel using digital photopatterning technology, which combines digital projection photolithography [ 32–39 ] with computer‐generated holography. [ 40–42 ] In this work, simulated computer‐generated holography (SCGH) was used to generate customized digital patterns based on DOE designs, and these digital patterns were uploaded onto a digital micromirror device (DMD) to generate virtual masks (instead of conventional physical masks) to enable rapid printing of hDOEs.…”
Section: Introductionmentioning
confidence: 99%
“…In this work, we report the design and printing of customized DOEs on synthetic PEGDA hydrogel using digital photopatterning technology, which combines digital projection photolithography [ 32–39 ] with computer‐generated holography. [ 40–42 ] In this work, simulated computer‐generated holography (SCGH) was used to generate customized digital patterns based on DOE designs, and these digital patterns were uploaded onto a digital micromirror device (DMD) to generate virtual masks (instead of conventional physical masks) to enable rapid printing of hDOEs.…”
Section: Introductionmentioning
confidence: 99%
“…11 Printing complex 3D structures is possible with additive methods based on extrusion-based fused deposition modeling and light-based digital projection lithography, but the resolution of these methods is typically limited to *50 lm or lower. [12][13][14] Multiphoton polymerization (MPP) is capable of printing 3D structures using soft materials with nano-to-micrometer resolution, yet low scalability makes this process unfeasible for making centimeter-scale constructs. 15,16 Newer advancement in additive manufacturing techniques such as continuous liquid interphase printing (CLIP) enables high-resolution printing in a quick and continuous manner.…”
Section: Introductionmentioning
confidence: 99%
“…However, the high cost, time consuming nature, and lack of flexibility of mask manufacturing have become the bottlenecks of lithography [ 1 ]. In recent years, electron beam [ 2 ], laser direct writing [ 3 ], laser interference lithography [ 4 ], focused ion beam [ 5 ], and DMD projection lithography [ 6 ] are employed to solve this problem. These lithographic methods are mostly single-spot exposure, and even the area array multi-point projection exposure of DMD has a small exposure area at high resolution.…”
Section: Introductionmentioning
confidence: 99%