2008
DOI: 10.1088/0957-4484/19/43/435303
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Parallel-local anodic oxidation of silicon surfaces by soft stamps

Abstract: We investigate the fabrication of nanometric patterns on silicon surfaces by using the parallel-local anodic oxidation technique with soft stamps. This method yields silicon oxide nanostructures 15 nm high, namely at least five times higher than the nanostructures made with local anodic oxidation using atomic force microscopy, and thanks to the size of the stamp enables one to pattern the surface across a centimetre length scale. To implement this technique, we built a machine to bring the metallized polydimet… Show more

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Cited by 59 publications
(56 citation statements)
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“…21 in the main text. In order to put the stamp in contact with the substrate, we placed the sample holders at the bottom of the apparatus, so that the stamp was fixed on stamp holder in the top-side and moved downward by a micrometric screw.…”
Section: Methodsmentioning
confidence: 99%
“…21 in the main text. In order to put the stamp in contact with the substrate, we placed the sample holders at the bottom of the apparatus, so that the stamp was fixed on stamp holder in the top-side and moved downward by a micrometric screw.…”
Section: Methodsmentioning
confidence: 99%
“…Techniques such as ion beam lithography [48][49][50], electron beam lithography (EBL) [51], nanoimprint [52], or scanning probe lithography [53,54] enable one to achieve highresolution nanostructuring, i.e. precise positioning and sizing down to a scale of a few nanometres.…”
Section: Ordered Arrays Of Nanoelectrodes By Nanolithographymentioning
confidence: 99%
“…Topdown techniques, such as ion beam lithography [4,10,11], electron beam lithography (EBL) [12], nanoimprint [13] or scanning probe lithography [14,15], allow one to achieve high resolution nanostructuring, providing a precise positioning and sizing down to a scale of a few nanometres.…”
Section: Introductionmentioning
confidence: 99%