“…Resistive random access memory (RRAM) devices have attracted considerable attentions due to its advantages of simple structures, rapid programming speed, high areal density, low power consumption and long retention time [1][2][3][4][5], and it is proposed as a potential next-generation candidate for nonvolatile memory. Various materials presenting resistive switching characteristics have been reported, including transition metal oxide materials (TMO), such as NiO, ZrO 2 , ZnO, TiO 2 , HfO 2 , Nb 2 O 5 , Cu x O [5][6][7][8][9][10], chalcogenides, perovskite oxides and organic materials [11][12][13].…”