Oxide-Based Materials and Devices IV 2013
DOI: 10.1117/12.2004173
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P-type ZnO films by phosphorus doping using plasma immersion ion-implantation technique

Abstract: ZnO has been a subject of intense research in the optoelectronics community owing to its wide bandgap (3.3eV) and large exciton binding energy (60meV). However, difficulty in doping it p-type posts a hindrance in fabricating ZnObased devices. In order to make p-type ZnO films, phosphorus implantation, using plasma immersion ion-implantation technique (2kV, 900W, 10µs pulse width) for 30 seconds, was performed on ZnO thin film deposited by RF Magnetron Sputtering (Sample A). The implanted samples were subsequen… Show more

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“…We have previously reported on p-type ZnO films implanted with phosphorus by plasma immersion ion implantation (PIII). 18,19 The same approach has extended to ZnMgO thin films in an attempt to achieve reliable and reproducible p-type films. Although a dominating acceptor peak was not detected, the implantation of phosphorus ions into Zn 1Àx Mg x O by PIII shows promise.…”
mentioning
confidence: 97%
“…We have previously reported on p-type ZnO films implanted with phosphorus by plasma immersion ion implantation (PIII). 18,19 The same approach has extended to ZnMgO thin films in an attempt to achieve reliable and reproducible p-type films. Although a dominating acceptor peak was not detected, the implantation of phosphorus ions into Zn 1Àx Mg x O by PIII shows promise.…”
mentioning
confidence: 97%