P‐190L: Late‐News Poster: Thermal Durability of Poly‐Si Films on Highly Engineered Glass for RTA Processes Enabling Advanced TFTs

Abstract

The thermal durability of Jade@ glass for poly‐Si and conventional glass for a‐Si were investigated for the rapid thermal annealing (RTA) process. The average roughness (Ra) of poly‐Si film on Jade glass after annealing at 850 °C for 1 hour was around 0.5 nm, significantly smoother than that of a‐Si glass. The internal stress of poly‐Si film on Jade glass by 750 °C annealing temperature is lower with results of ∼103 MPa compared to ∼105 MPa of a‐Si glass. The thermal durability of glass for RTA process is associated with the annealing point of glass.