P‐145: Optimization of Molybdenum Oxides for Low‐Reflectance Thin Films using Numerical Simulation

Abstract

Mo-oxide thin films were investigated for low-reflectance applications. Numerical simulation was used to optimize the optical properties (reflectance and color) of the thin films. Reflectance could be considerably reduced to values of 6% (@ 550 nm) maintaining a colorless black film.

22.2: Invited Paper: Sputtered Molybdenum‐Oxide for Anti‐Reflection Layers in Displays: Optical Properties and Thermal Stability

“…1. A fully reactive process [4] [6] [7] uses a metallic target and an Ar/O 2 gas mixture in the sputtering chamber containing a high amount of oxygen (~30-50 Vol.-%) during process. However, for a stable process the oxygen partial pressure must be also spatially very well controlled to obtain a specific stoichiometry in the deposited thin film, which is a severe obstacle for large scale application.…”

“…One critical item is the effective suppression of ambient light reflection at of the highly reflective metallization in the TFTbackplane, enabling a darker appearance in the black state, and therefore a higher contrast ratio of the whole panel. An identical approach could be taken by covering metal lines for touch applications [1]. Likewise, the need for a low reflective layer becomes apparent when the bezel of a display should be as narrow as possible, and part of the highly reflective metallization lies close to the frame.…”

“…One promising candidate with the right optical properties can be found in Molybdenum-oxide (MoOx), with its pure metallic form, Molybdenum, already routinely used as Gate-, Source/Drain and Barrier-metal in TFT arrays in the display industry since more than 20 years. MoOx offers excellent adhesion [1], it is suitable for process integration and comes with several material properties which allow to tune its electronic and optical characteristics.…”