Morphology, structure, and tribological behavior of magnetron co-sputtered TiN/Ag nanocomposite coatings deposited at 150°C with an Ag content in the range of 7-45 at.% were characterized. The coatings show a columnar structure with embedded Ag crystallites of 3-50 nm in diameter, where the columns are characterized by a layered structure with Ag-poor and Ag-rich layers. These layers originate from sample rotation during deposition, where the layer thickness increases with increasing Ag content. These Ag layers become continuous over a critical Ag content. At room temperature the friction coefficient is determined by the film structure, whereas friction and wear at high temperature depend on segregation of Ag to the surface.
A methodology is presented that allows the determination of experimental stress factors in thin films on the basis of static diffraction measurements. The approach relies on the characterization of thin films deposited on a monocrystalline substrate serving as a mechanical sensor. Rocking-curve measurements of the symmetrical reflections of the substrate are used to determine the substrate curvature and subsequently the macroscopic stress imposed on the film. The elastic strain in the film is determined by lattice-spacing measurement at different sample tilt angles. The calculated experimental stress factors are applied to thin films deposited on other types of substrates and are used to determine the absolute magnitude of the residual stress. The approach is applied to nanocrystalline TiN and CrN thin films deposited on Si(100) and steel substrates, characterized using a laboratory-type / goniometer. research papers
The current work investigates the microstructure and property relations of molybdenum oxide thin films synthesized by reactive dc magnetron sputtering in an industrial-scale sputter deposition plant using a rotatable molybdenum target with varying oxygen/argon gas flow ratio. The evolution of microstructure and chemical bonds as a function of oxygen partial pressure was studied by x-ray diffraction, Raman spectroscopy, and x-ray photoelectron spectroscopy. With oxygen partial pressure raising from 0% to 100%, the film growth rate decreased from 350 to 50 nm/min, while the oxygen content within the films increased up to 75 at. %. The films were dominated by MoO2, polymorphs of Mo4O11 and Mo9O26, and MoO3 phases. The electrical properties changed from electrically conductive to insulating with increasing oxygen partial pressure. The optical properties are versatile, e.g., transmittance values up to 80%, absorbance values between 50% and 80% and reflectance values up to 55%, depending on the oxygen content. In general, it can be concluded that microstructure and properties of molybdenum oxide thin films can be adjusted by varying the oxygen/argon gas flow ratio and might thus enable their use in a wide range of optical and electronic applications.
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