2018
DOI: 10.1016/j.apsusc.2018.05.105
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Oxygen plasma etching of fused silica substrates for high power laser optics

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Cited by 23 publications
(8 citation statements)
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“…The first option is to replace the iPhone 13 Pro with a well-packaged camera that can capture photons with a wide range of wavelengths, from infrared to UV. Additionally, the Schott D263M Glass can be substituted with a glass having a wider transmittance range, such as UV Fused Silica (UVFS, 195–2100 nm) or CaF 2 (170–8000 nm) These glasses possess excellent chemical resistance and are extensively used in advanced optical systems. , More significantly, both UV Fused Silica and CaF 2 can resist plasma etching to a certain extent. , To confirm and compare the performance of these potential glass materials, further testing is required.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…The first option is to replace the iPhone 13 Pro with a well-packaged camera that can capture photons with a wide range of wavelengths, from infrared to UV. Additionally, the Schott D263M Glass can be substituted with a glass having a wider transmittance range, such as UV Fused Silica (UVFS, 195–2100 nm) or CaF 2 (170–8000 nm) These glasses possess excellent chemical resistance and are extensively used in advanced optical systems. , More significantly, both UV Fused Silica and CaF 2 can resist plasma etching to a certain extent. , To confirm and compare the performance of these potential glass materials, further testing is required.…”
Section: Resultsmentioning
confidence: 99%
“…79,80 More significantly, both UV Fused Silica and CaF 2 can resist plasma etching to a certain extent. 81,82 To confirm and compare the performance of these potential glass materials, further testing is required.…”
Section: Limit Of Detection (Lod) and Linearity Rangementioning
confidence: 99%
“…Plasma ablation is the plasma-aided surface etching of materials, very similar to sputtering, without using any liquid etchant. A major share of plasma etching has been carried out with oxygen plasma [ 181 , 182 , 183 ] where oxygen, the precursor gas, was channeled into a vacuum chamber. During the process, the most peripheral layer of the substrate is etched off, and accordingly, a negligibly small weight loss occurs [ 184 , 185 ].…”
Section: Plasma Surface Modification (Psm)mentioning
confidence: 99%
“…However, the input power of optical fibers is limited for the laser-induced damage 3 6 In the laser system, as the carrier of the laser, the optical fiber is the main component affected by laser-induced damage 7 9 Therefore, enhancing the transport capacity of optical fibers is of great significance for the development of high-power lasers.…”
Section: Introductionmentioning
confidence: 99%