2001
DOI: 10.1016/s0022-3093(00)00370-7
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Oxidized silicon surfaces studied by high resolution Si 2p core-level photoelectron spectroscopy using synchrotron radiation

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Cited by 53 publications
(59 citation statements)
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“…[ 11 , 49 ] The shift of Si(0) binding energy probably results from different oxidation state of materials. [ 50 ] It is clear that Si is partially oxidized after carbon coating even under Ar atmosphere (Grade 5.0 Ar is used), consistent with previous fi ndings. [ 51 ] The key difference between Si-1100-620 and Si-1100-800 is that, as carbon coating temperature increases, the intensity of the SiO x region decreases and the intensity of the Si(4 + ) peak (corresponding to SiO 2 ) increases relative to the intensity of the Si(0) peak, which may be due to disproportionation of SiO x and/or its reduction by acetylene.…”
Section: Full Papersupporting
confidence: 90%
“…[ 11 , 49 ] The shift of Si(0) binding energy probably results from different oxidation state of materials. [ 50 ] It is clear that Si is partially oxidized after carbon coating even under Ar atmosphere (Grade 5.0 Ar is used), consistent with previous fi ndings. [ 51 ] The key difference between Si-1100-620 and Si-1100-800 is that, as carbon coating temperature increases, the intensity of the SiO x region decreases and the intensity of the Si(4 + ) peak (corresponding to SiO 2 ) increases relative to the intensity of the Si(0) peak, which may be due to disproportionation of SiO x and/or its reduction by acetylene.…”
Section: Full Papersupporting
confidence: 90%
“…16 As a dielectric material, a-SiO 2 thin films are also used as a planar capacitor in the traditional metal-oxide-semiconductor (MOS) structure. 17 Due to the importance of the amorphous thin film in a variety of applications, several recent studies on thermal/phonon transport across crystallinejamorphous heterojunctions were carried out. [18][19][20] Specifically, Deng et al 19 studied phonon transport across a Sija-SiO 2 jSi structure using a phonon wave packet (WP) method and found that the phonon transmission coefficient decreases almost monotonically with increasing phonon frequency.…”
Section: Introductionmentioning
confidence: 99%
“…1͒. 12 Although there is still some disagreement as to the origin of each component, as well as suggestions of the existence of additional components, [13][14][15][16] the main peak located at around 0.0 eV relative binding energy is accepted as that of elemental Si ͑Si 0 ͒ and that at 4.4 eV as that of the stoichiometric oxide ͑Si 4+ ͒. From the measured ratio of Si 4+ intensity to Si 0 intensity and previous analyses of experimental data 4,12,16 that yield the electron inelastic mean free path in the oxide at our energy as 9.8 Å and the ratio of intensities from pure bulk Si and pure bulk SiO 2 as 1.47, the thickness of stoichiometric oxide can be calculated.…”
mentioning
confidence: 99%