Oxide Coated Cathode Plasma Source of Linear Magnetized Plasma Device

Abstract

Plasma source is the most important part of the laboratory plasma platform for fundamental plasma experimental research. Barium oxide coated cathode plasma source is well recognized as an effective technique due to its high electron emission current. An indirectly heated oxide coated cathode plasma source has been constructed on a linear magnetized plasma device. The electron emission current density can reach 2 A/cm 2 to 6 A/cm 2 in pulsed mode within pulse length 5-20 ms. A 10 cm diameter, 2 m long plasma column with density 10 18 m −3 to 10 19 m 3 and electron temperature Te 3-7 eV is produced. The spatial uniformity of the emission ability is less than 4% and the discharge reproducibility is better than 97%. With a wide range of the plasma parameters, this kind of plasma source provides great flexibility for many basic plasma investigations. The detail of construction and initial characterization of oxide coated cathode are described in this paper.

Design of Thomson scattering diagnostic system on linear magnetized plasma device

“…The experimental region is 2 m in length and 0.25 m in diameter. LMP operates in an oxide-coated cathode [13] pulse discharge mode with 1 Hz repetition frequency and a duration time from 10 to 20 ms. The typical plasma parameters are A electron density of - The incident laser is provided by a Quanta-Ray Nd:YAG laser operating at its second harmonic mode with a 30 Hz repetition frequency.…”

Bench test of interferometer measurement for the Keda Reconnection eXperiment device (KRX)

“…The KRX is a φ 3 10 ´m cylindrical vacuum chamber facility, as shown in figure 1. The plasma is produced by hot cathode source in the top of the vacuum chamber [11]. The electrons emitted from the hot cathode ionize the inert gas (argon or helium) and the uniform plasma can be produced.…”

Electrochromism of W–Ti Oxide Thin Films: Cycling Durability, Potentiostatic Rejuvenation, and Modelling of Electrochemical Degradation

“…Durability is a multifaceted property 5 and has attracted much attention recently; it entails aspects such as thin-film deposition under optimized conditions [1][2][3][4] as well as additives to the base electrochromic material. Additions of titanium have been studied in particular detail and have involved films prepared by evaporation, [6][7][8] sputtering, [9][10][11][12][13][14][15][16][17][18] various chemical 9,[19][20][21][22][23][24][25][26][27][28] and electrochemical [29][30][31][32] techniques, as well as plasma polymerization. 33 In-depth studies of films made by sputtering 12,13 and chemical deposition 25,28 -using electrochemical techniques, transmission electron microscopy, atomic force microscopy, Raman spectroscopy, and more-have demonstrated unambiguously that additions of Ti provide increased structural and electrochemical stability to WO 3 .…”