2021
DOI: 10.1021/acsomega.1c02029
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Oxidative MLD of Conductive PEDOT Thin Films with EDOT and ReCl5 as Precursors

Abstract: Because of its high conductivity and intrinsic stability, poly(3,4-ethylenedioxythiophene (PEDOT) has gained great attention both in academic research and industry over the years. In this study, we used the oxidative molecular layer deposition (oMLD) technique to deposit PEDOT from 3,4-ethylenedioxythiophene (EDOT) and a new inorganic oxidizing agent, rhenium pentachloride (ReCl 5 ). We extensively characterized the properties of the films by scanning electron microscopy, X-ray diffraction, X-ray photoelectron… Show more

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Cited by 10 publications
(21 citation statements)
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“…The self-terminating surface reactions in MLD processes allow for the formation of uniform coatings on complex 3D surfaces. ,, oMLD is similar to conventional MLD but employs alternating exposures of a monomer and gas-phase chemical oxidant to drive surface-based radical polymerization reactions. To date, pEDOT is the only polymer that has been demonstrated using the oMLD technique. ,, …”
Section: Introductionmentioning
confidence: 99%
“…The self-terminating surface reactions in MLD processes allow for the formation of uniform coatings on complex 3D surfaces. ,, oMLD is similar to conventional MLD but employs alternating exposures of a monomer and gas-phase chemical oxidant to drive surface-based radical polymerization reactions. To date, pEDOT is the only polymer that has been demonstrated using the oMLD technique. ,, …”
Section: Introductionmentioning
confidence: 99%
“…22,23 Recently, deposition of PEDOT was realized with MLD through oxidization of EDOT monomers with oxidant precursors, including MoCl 5 and ReCl 5 . 24,25 Although the reaction mechanism still needs to be further understood, these reports demonstrate a feasibility to deposit high-quality OSC films by utilizing the advantages of the MLD technology.…”
Section: ■ Introductionmentioning
confidence: 93%
“…Atomic or molecular layer deposition (ALD/MLD) has been extensively applied in film growth due to its feasibility to grow highly conformal and uniform films with precisely controlled nanoscale thicknesses. Particularly, MLD can be used to synthesize polymers through condensation polymerization between different multifunctional organic precursors, e.g., ultrathin polythiourea films were successfully deposited by MLD through the coupling reaction of isothiocyanates and amines. , However, most OSCs, including polythiophene, polypyrrole, and poly­(3,4-ethylenedioxythiophene) (PEDOT), cannot be synthesized by condensation reactions, and thus are difficult to be deposited using the MLD method. , Recently, deposition of PEDOT was realized with MLD through oxidization of EDOT monomers with oxidant precursors, including MoCl 5 and ReCl 5 . , Although the reaction mechanism still needs to be further understood, these reports demonstrate a feasibility to deposit high-quality OSC films by utilizing the advantages of the MLD technology.…”
Section: Introductionmentioning
confidence: 99%
“…New organic components have also been developed for the purely organic MLD processes; the MLD material library already includes, besides the initially introduced polyimides [ 15,17–22,137–143 ] and polyamides, [ 15,23–28,144–149 ] many other polymers: polyurea, [ 29,30,37,38,51,150–164 ] polythiourea, [ 52 ] polyurethane, [ 165,166 ] polyazomethine, [ 167–172 ] poly(3,4‐ethylenedioxy‐thiophene), [ 173–177 ] polyimide–polyamide, [ 141 ] poly(ethylene terephthalate) (PET), [ 50,178–180 ] and others. [ 31,32,39–44,176,181–200 ] In recent years, the organic precursor library has been rapidly expanding.…”
Section: Organic Precursors In Ald/mldmentioning
confidence: 99%