Oxidation behaviour of V2AlC MAX phase coatings

Ag Surface and Bulk Segregations in Sputtered ZrCuAlNi Metallic Glass Thin Films

“…Despite the presence of Ag segregations on the surface of the films deposited at 60 °C, the resistivity marginally increased with increasing Ag content. The fact that, due to lack of thermal activation, no Ag segregates can form in the bulk of the film may be re- Previously, electrical resistivity has been employed to track phase transitions within Cr 2 AlC [46] and the oxidation behavior of TiN and V 2 AlC [47,48]. In this work, we show for the first time, that the formation of Ag segregations in sputtered ZrCuAlNi metallic glass thin films can be tracked by resistivity measurements.…”

V2CTX catalyzes polysulfide conversion to enhance the redox kinetics of Li–S batteries

“…The typical diffraction peaks at 2θ = 13.48°, 35.66°, 41.2°and 55.51°belong to V 2 AlC (green line). 27 After etching, the XRD peaks at 2θ = 7.44°, 14.7°, 22.18°, 29.41°are attributed to the (002), (004), (006), and (008) planes of V 2 CT X ( purple line), respectively, 26 while the diffraction peaks of V 2 AlC disappear, indicating the removal of the aluminum layer from V 2 AlC, further confirming that the V 2 CT X is successfully prepared, consistent with TEM results.…”

Processing of MAX phases: From synthesis to applications

“…Unfortunately, not all Al‐based MAX phases form an external protective alumina layer due to the “competition” between the oxidation of the “M” and “A” elements 25 . Ti 2 AlC, Ti 3 AlC 2 and Cr 2 AlC form protective Al 2 O 3 scales, but V 2 AlC, 54,55 Ta 2 AlC 56 and Nb 2 AlC 57 form M‐oxides such as V 2 O 5 , Ta 2 O 5 and Nb 2 O 5 , respectively, at low temperatures (600°C‐900°C). Consequently, only Ti 2 AlC, Ti 3 AlC 2 and Cr 2 AlC are considered to operate under aggressive environments at high temperatures (900°C‐1400°C) for extended periods.…”