2018
DOI: 10.1016/j.surfcoat.2018.06.048
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Oxidation barrier of Cu and Fe powder by Atomic Layer Deposition

Abstract: Pinhole free, uniform and conformal oxidation barrier on Cu and Fe powder.• Proper agitation of the powder is required and performed by a rotating ALD reactor.• Al2O3 coating of 8 nm on Cu powder causes a shift of oxidation temperature of 200 °C • Al2O3 coating of 25 nm on Fe powder causes a shift of oxidation temperature of 400 °C

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Cited by 16 publications
(13 citation statements)
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“…Atomic layer deposition (ALD) is a thin film deposition technique that allows the preparation of inorganic layers with extreme control of their nanoscale thickness [41], and excellent conformality of the deposits on challenging substrates, a feature that is a unique to ALD [42]. Therefore, ALD has been very useful in many different areas, such as microelectronics [43], but also membranes [44,45], photovoltaics [46], and biosensing [43].…”
Section: Introductionmentioning
confidence: 99%
“…Atomic layer deposition (ALD) is a thin film deposition technique that allows the preparation of inorganic layers with extreme control of their nanoscale thickness [41], and excellent conformality of the deposits on challenging substrates, a feature that is a unique to ALD [42]. Therefore, ALD has been very useful in many different areas, such as microelectronics [43], but also membranes [44,45], photovoltaics [46], and biosensing [43].…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, nanostructured materials are composed of interlinked parts in the nanoscale range [ 3 ]. Nanoparticles and nanostructured materials can be made of simple materials (e.g., metal, carbon, polymer) [ 4 ], of composites (e.g., polymer-metal, silica-metal, graphene-metal), or in the core-shell form [ 5 , 6 , 7 , 8 ].…”
Section: Introductionmentioning
confidence: 99%
“…There are many ways to develop a sufficiently large surface area on the ceramic surface: oxidation, application of characteristic functional groups, silanization, thermal treatment in a gas atmosphere, melt infiltration, ionic liquid etching, sol-gel process, and co-precipitation [30][31][32][33][34][35]. For example, the chemical etching processes have a large amount of literature focused on chemical etching concerns for the preparation of the ZrO 2 surface in a way that enables permanent bonding to hard dental tissues or composite materials [35].…”
Section: Introductionmentioning
confidence: 99%