Oxidation and Thermal Scanning Probe Lithography for High-Resolution Nanopatterning and Nanodevices

Ryu, Yu Kyoung; Knoll, Armin W.

doi:10.1007/978-3-030-15612-1_5

Cited by 7 publications

(10 citation statements)

References 180 publications

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“…The potential of tSPL has been also explored with regards to the heat‐induced local rearrangement of atoms to facilitate the crystallization of amorphous materials by activating diffusion. [ 11,12,14,46 ] In this framework, it has been demonstrated the possibility of systematically creating, in a non‐magnetic thin film of CoFe 2 O 4 gel, crystallized nanodisks with ferromagnetic vortex domains by performing a local annealing with a heated AFM tip at 700 °C. [ 47 ] By varying the heating times between 15 and 150 s, the resulting diameters of the nanodisks increased from 150 to 300 nm.…”

Section: Applicationsmentioning

confidence: 99%

“…The potential of tSPL has been also explored with regards to the heat-induced local rearrangement of atoms to facilitate the crystallization of amorphous materials by activating diffusion. [11,12,14,46] In this framework, it has been demonstrated the possibility of systematically creating, in a non-magnetic thin film of CoFe 2 O 4 gel, crystallized nanodisks with ferromagnetic [8] Copyright 2018, Springer Nature. b) Working principle of the thermally assisted magnetic scanning probe lithography (tamSPL) for the local engineering of the exchange bias field in ferromagnet/antiferromagnet multilayers and formation of patterns with tunable direction of the magnetization.…”

Section: Nanomagnetism and Spintronicsmentioning

confidence: 99%

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Phase Nanoengineering via Thermal Scanning Probe Lithography and Direct Laser Writing

Levati

Girardi

Pellizzi

et al. 2023

Adv Materials Technologies

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Nanomaterials derive their electronic, magnetic, and optical properties from their specific nanostructure. In most cases, nanostructured materials and their properties are defined during the materials growth, and nanofabrication techniques, such as lithography, are employed subsequently for device fabrication. Herein, a perspective is presented on a different approach for creating nanomaterials and devices where, after growth, advanced nanofabrication techniques are used to directly nanostructure condensed matter systems, by inducing highly controlled, localized, and stable changes in the electronic, magnetic, or optical properties. Then, advantages, limitations, applications in materials science and technology are highlighted, and future perspectives are discussed.

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Section: Applicationsmentioning

confidence: 99%

Section: Nanomagnetism and Spintronicsmentioning

confidence: 99%

Phase Nanoengineering via Thermal Scanning Probe Lithography and Direct Laser Writing

Levati

Girardi

Pellizzi

et al. 2023

Adv Materials Technologies

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“…Despite the fact that some SPL techniques with nanometer resolution were already demonstrated 30 years ago 5 , today, SPL techniques are primarily used in academic research. This can be attributed to the slow writing speed of some SPL techniques, on the order of 0.1-50 μm/s in the case of oxidation SPL 6 .…”

Section: Introductionmentioning

confidence: 99%

“…This article provides an overview of the most recent t-SPL techniques and provides an exhaustive list of materials that have been modified or deposited through t-SPL. We also discuss relevant fabrication processes developed or adapted for t-SPL that were not covered in previous articles 2,3,6 . t-SPL techniques have been categorized into the removal, conversion, and addition of material, as illustrated in Fig.…”

Section: Introductionmentioning

confidence: 99%

Thermal scanning probe lithography—a review

et al. 2020

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Fundamental aspects and state-of-the-art results of thermal scanning probe lithography (t-SPL) are reviewed here. t-SPL is an emerging direct-write nanolithography method with many unique properties which enable original or improved nano-patterning in application fields ranging from quantum technologies to material science. In particular, ultrafast and highly localized thermal processing of surfaces can be achieved through the sharp heated tip in t-SPL to generate high-resolution patterns. We investigate t-SPL as a means of generating three types of material interaction: removal, conversion, and addition. Each of these categories is illustrated with process parameters and application examples, as well as their respective opportunities and challenges. Our intention is to provide a knowledge base of t-SPL capabilities and current limitations and to guide nanoengineers to the best-fitting approach of t-SPL for their challenges in nanofabrication or material science. Many potential applications of nanoscale modifications with thermal probes still wait to be explored, in particular when one can utilize the inherently ultrahigh heating and cooling rates.

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“…The higher resolution achievable in SPL is the consequence of applying super sharp conductive tips (can be as sharp as one atom in theory) that facilitate confinement of the field driven between the tip and proximal sample during the writing and reading process. Scanning probe lithography (SPL) offers advantages over other lithography and patterning approaches such as low operational costs, higher resolution, − capability to pattern different substrates, − concurrent imaging and patterning (“closed-loop lithography”), omission of electron column or optical components, and potential of being used as an in-line nondestructive metrology tool for industrial purposes. However, its patterning speed has yet to reach industrial demand for patterning more than 100 wafers per hour.…”

mentioning

confidence: 99%

Advanced Scanning Probe Nanolithography Using GaN Nanowires

et al. 2021

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A fundamental understanding and advancement of nanopatterning and nanometrology are essential in the future development of nanotechnology, atomic scale manipulation, and quantum technology industries. Scanning probe-based patterning/imaging techniques have been attractive for many research groups to conduct their research in nanoscale device fabrication and nanotechnology mainly due to its cost-effective process; however, the current tip materials in these techniques suffer from poor durability, limited resolution, and relatively high fabrication costs. Here, we report on employing GaN nanowires as a robust semiconductor material in scanning probe lithography (SPL) and microscopy (SPM) with a relatively low-cost fabrication process and the capability to provide sub-10 nm lithography and atomic scale (<1 nm) patterning resolution in field-emission scanning probe lithography (FE-SPL) and scanning tunneling microscopy (STM), respectively. We demonstrate that GaN NWs are great candidates for advanced SPL and imaging that can provide atomic resolution imaging and sub-10 nm nanopatterning on different materials in both vacuum and ambient operations.

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Oxidation and Thermal Scanning Probe Lithography for High-Resolution Nanopatterning and Nanodevices

Cited by 7 publications

References 180 publications

Phase Nanoengineering via Thermal Scanning Probe Lithography and Direct Laser Writing

Phase Nanoengineering via Thermal Scanning Probe Lithography and Direct Laser Writing

Thermal scanning probe lithography—a review

Advanced Scanning Probe Nanolithography Using GaN Nanowires

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