Outgassing properties and structure of TiN films on stainless steel substrates

Tsukahara, Sonoko; Saitoh, Kazuya; Inayoshi, Sakae; Onoe, Kohsei

doi:10.1016/0042-207x(92)90340-3

Cited by 10 publications

(7 citation statements)

References 2 publications

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“…with a stoichiometric composition, and deposited at a substrate bias voltage more negative than Ϫ100 V. The optimized preparation conditions are consistent with the previous results obtained from the thermal desorption spectroscopy experiments 8. …”

supporting

confidence: 87%

“…We have used thermal desorption spectroscopy to show that the quantity of water adsorbed on TiN films prepared under optimum conditions is the same order as that of an electrolytically polished stainless steel 8 and that the TiN film works as a barrier to the hydrogen diffusion, thereby effectively reducing the outgassing of hydrogen. We have used thermal desorption spectroscopy to show that the quantity of water adsorbed on TiN films prepared under optimum conditions is the same order as that of an electrolytically polished stainless steel 8 and that the TiN film works as a barrier to the hydrogen diffusion, thereby effectively reducing the outgassing of hydrogen.…”

Section: Introductionmentioning

confidence: 99%

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TiN thin film on stainless steel for extremely high vacuum material

Saito¹,

Inayoshi²,

Ikeda³

et al. 1995

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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We have shown that titanium nitride ͑TiN͒ coating by activated reactive evaporation using the hollow cathode discharge method is a good surface treatment for stainless steel used in extremely high vacuum ͑XHV͒ applications. The TiN film blocks hydrogen diffusion because it has a much lower hydrogen permeation coefficient than stainless steel. By varying the coating and film parameters ͑e.g., thickness, composition, and substrate bias voltage V b ͒ the barrier effects on hydrogen permeation of the TiN films were evaluated using small membrane samples. The parameters were varied to optimize the properties of the TiN coating for vacuum materials. The structure of the TiN films was analyzed by an x-ray diffractometry and transmission electron microscopy to clarify the dependence of the barrier effect on the film structure. Stoichiometric TiN films with few defects were shown to have high barrier effects. To demonstrate the use of TiN coatings for XHV applications, the outgassing rates of a stainless steel chamber with and without a TiN film were measured by a modified throughput type apparatus that had a bakeable cryopump for obtaining XHV. The outgassing rates for the chambers were measured using a method which completely eliminated the outgassing contribution of the vacuum gauges. The nitrogen equivalent outgassing rates of the stainless steel chamber with and without a TiN film were 7ϫ10 Ϫ12 and 9.7ϫ10 Ϫ10 Pa m s Ϫ1 , respectively.

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supporting

confidence: 87%

Section: Introductionmentioning

confidence: 99%

TiN thin film on stainless steel for extremely high vacuum material

Saito¹,

Inayoshi²,

Ikeda³

et al. 1995

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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“…18 The maximum outgassing rate of water vapor appears in the measurement range of 140-200°C as is shown in Fig. Thus the effect of temperature rise due to the ion plating process can be neglected against the total time of baking process in the measurement of outgassing rate.…”

Section: Discussionmentioning

confidence: 97%

Vacuum characteristics of titanium

Minato¹,

Itoh²

1995

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Little attention has been paid to metals other than stainless steels and aluminum alloys as materials for ultrahigh vacuum ͑UHV͒ and extremely high vacuum ͑XHV͒ chambers. Titanium is another candidate material for use in UHV and XHV applications. To obtain basic data for the application of titanium to UHV and XHV, an apparatus employing the conductance modulation method was fabricated for the measurement of the outgassing rate. In the measurement of the outgassing rate of small samples, it was found that the outgassing rate of titanium decreased 1.5 times faster than that of stainless steel. Furthermore, a TiN coating was found to reduce the total amount outgassed from 1.78ϫ10 Ϫ2 to 1.17ϫ10 Ϫ2 Pa m 3 in the measurement of titanium and from 1.02ϫ10 Ϫ1 to 9.22ϫ10 Ϫ3 Pa m 3 in the measurement of stainless steel. In a mass analysis of the gases from the samples, the ion current of hydrogen from chemically polished titanium, chemically polished and TiN-coated titanium, and TiN-coated stainless steel decreased after attaining a maximum, while that from buffed and electropolished stainless steel increased continuously during the baking at 200°C. Considering these results, a vacuum chamber made of titanium coated with TiN and a vacuum chamber made of electropolished stainless steel were prepared and pumped down into XHV region. The pressure of the titanium chamber reached 6ϫ10 Ϫ11 Pa after a 312 h baking at 250°C, while the stainless steel chamber required a 434 h baking at 250°C to attain the ultimate pressure of 7ϫ10 Ϫ11 Pa. The pressure of the titanium chamber decreased more rapidly than that of the stainless steel chamber during the baking at 250°C.

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“…[1][2][3][4] In situ deposition of getter films is common practice in modern vacuum technology to actively pump chemically reactive gases. To fulfill this ''passive'' function, films of nonreactive materials are considered which are usually produced ex situ.…”

Section: Introductionmentioning

confidence: 99%

Nonevaporable getter films for ultrahigh vacuum applications

Benvenuti

Chiggiato

Cicoira

et al. 1998

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Articles you may be interested inElectron-stimulated desorption from polished and vacuum fired 316LN stainless steel coated with Ti-Zr-Hf-V Electron stimulated desorption from bare and nonevaporable getter coated stainless steels Influence of electron irradiation and heating on secondary electron yields from non-evaporable getter films observed with in situ x-ray photoelectron spectroscopy Influence of the elemental composition and crystal structure on the vacuum properties of Ti-Zr-V nonevaporable getter filmsThe vacuum behavior of stainless steel vacuum chambers, ex situ sputter coated with a thin film (ϳ1 m) of getter material, has been studied to determine if after air exposure the getter film could be activated by a bakeout so as to transform the coated vacuum chamber into a pump. The materials studied so far are Ti, Zr, Hf, and some of their binary alloys. They all display an activation temperature lower than 400°C, i.e., within the reach of the baking temperature of stainless steel vacuum chambers. The lowest activation temperature of 200-250°C, measured for an equiatomic alloy of Ti and Zr, allows extension of this method to chambers made of copper and aluminum alloys. The experimental results, described here in detail, indicate that the values of the activation temperature obtained using electron stimulated desorption, pumping speed, and Auger spectroscopy measurements are self-consistent.

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Outgassing properties and structure of TiN films on stainless steel substrates

Cited by 10 publications

References 2 publications

TiN thin film on stainless steel for extremely high vacuum material

TiN thin film on stainless steel for extremely high vacuum material

Vacuum characteristics of titanium

Nonevaporable getter films for ultrahigh vacuum applications

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