A systematic study of superconducting properties of niobium films sputtered on the inner wall of radiofrequency cavities is presented. The measured quantities include in particular the response to 1.5 GHz microwaves, the critical temperature, the penetration depth and the magnetic penetration field. In addition to films grown in different gas discharges (Xe, Kr, Ar and Ar/Ne mixtures) and to films grown on substrates prepared under different conditions, the study includes also bulk niobium cavities. The surface resistance is analysed in terms of its dependence on temperature, on RF field and, when relevant, on the density of trapped fluxons. A simple parameterisation is found to give a good fit to the data. Once allowance for the presence of impurities and defects is made by means of a single parameter, the electron mean free path, good agreement with BCS theory is observed. The fluxon-induced losses are studied in detail and their dependence on RF field, on temperature and on the density of trapped fluxons is analysed. The residual resistance is observed to be essentially uncorrelated with the other variables, suggesting that it is dominantly extragranular. In occasions very low residual resistances, in the nΩ range, have been maintained over a broad range of RF field, indicating the absence of significant fundamental limitations specific to the film technology in practical applications such as the production of accelerating cavities for particle accelerators.
Sputter-deposited thin films of TiZrV are fully activated after 24 h "in situ" heating at 180 °C. This activation temperature is the lowest of some 18 different getter coatings studied so far, and it allows the use of the getter thin film technology with aluminium alloy vacuum chambers, which cannot be baked at temperatures higher than 200 °C.An updated review is given of the most recent results obtained on TiZrV coatings, covering the following topics: influence of the elemental composition and crystal structure on activation temperature, discharge gas trapping and degassing, dependence of pumping speed and surface saturation capacity on film morphology, ageing consequent to activation-air venting cycles and ultimate pressures. Furthermore, the results obtained when exposing a coated particle beam chamber to synchrotron radiation in a real accelerator environment (ESRF Grenoble) are presented and discussed.
Articles you may be interested inElectron-stimulated desorption from polished and vacuum fired 316LN stainless steel coated with Ti-Zr-Hf-V Electron stimulated desorption from bare and nonevaporable getter coated stainless steels Influence of electron irradiation and heating on secondary electron yields from non-evaporable getter films observed with in situ x-ray photoelectron spectroscopy Influence of the elemental composition and crystal structure on the vacuum properties of Ti-Zr-V nonevaporable getter filmsThe vacuum behavior of stainless steel vacuum chambers, ex situ sputter coated with a thin film (ϳ1 m) of getter material, has been studied to determine if after air exposure the getter film could be activated by a bakeout so as to transform the coated vacuum chamber into a pump. The materials studied so far are Ti, Zr, Hf, and some of their binary alloys. They all display an activation temperature lower than 400°C, i.e., within the reach of the baking temperature of stainless steel vacuum chambers. The lowest activation temperature of 200-250°C, measured for an equiatomic alloy of Ti and Zr, allows extension of this method to chambers made of copper and aluminum alloys. The experimental results, described here in detail, indicate that the values of the activation temperature obtained using electron stimulated desorption, pumping speed, and Auger spectroscopy measurements are self-consistent.
Potential contributions to the residual surface resistance of niobium films exposed to 1.5 GHz microwaves are reviewed and studied. These include the oxidation of the film surface, the formation of hydride precipitates, the contamination by noble gas atoms and the presence of macroscopic film defects such as those resulting from the roughness of the substrate. Particular attention is given to the dependence of the residual resistance on the amplitude of the microwave. Results similar to those obtained for bulk niobium provide strong evidence against the conjecture that the small size of the film grains should be a fundamental limitation to the production of films having a low residual resistance.
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