Out-of-Plane Mirrors for Single-Mode Polymeric RDL using Direct Laser Writing

Mistry, Akash; Weyers, David; Nieweglowski, Krzysztof; Bock, Karlheinz

doi:10.1109/estc55720.2022.9939534

Cited by 5 publications

(1 citation statement)

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“…Since this is a well established process our focus is on reducing processing time and variation without degrading structure and thus optical quality. In [15] we achieved good results with OrmoComp resin, which is related to used WG material system. However OrmoComp has a strong tendency to overexposure causing the structures to look inflated, which causes additional lens effects.…”

Section: Min 2 Minmentioning

confidence: 75%

Hybrid Lithography Fabrication of Single Mode Optics for Signal Redistribution and Coupling

Weyers,

Nieweglowski,

Bock

2024

IMAPSource Proceedings

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This paper describes advances in hybrid-lithography process, combining UV-lithography for planar, single mode redistribution layer (RDL) and 2-photon- polymerization direct-laserwriting (2PP-DLW) for micro-mirrors inside RDL-opening. Improvements to multi-layer direct patterning of OrmoCore/-Clad material system using UV- ithography and need for broadband UV-LED source are presented. Near square core cross sections and smooth sidewalls are achieved. Openings in full stack with steep sidewalls without residual layer are patterned. To optimize 2PP-DLW-process processing window for both OrmoComp and IP-DIP is thoroughly characterized. Roughness measurements prove feasibility even of coarsely printed structure as reflective μ-mirror for 1550 nm wavelength. Finally these results are applied to periscope probe for wafer-level-testing of edge emitting lasers and proof of concept is shown. Outlook to further research on UV-lithography of multi-layer waveguide stack and alignment with μ-mirror printing is given.

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Section: Min 2 Minmentioning

confidence: 75%