2016
DOI: 10.1155/2016/3190260
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Out-of-Plane and In-Plane Magnetization Behavior of Dipolar Interacting FeNi Nanoislands around the Percolation Threshold

Abstract: Magnetic properties of inhomogeneous nanoisland FeNi films were studied by SQUID magnetometry. The FeNi films with nominal thickness ranging from 0.6 to 2.0 nm were deposited by rf sputtering on Sitall glass substrates and covered by a protecting Al2O3 layer on the top. The SQUID data indicate pronounced irreversibility behavior for the out-of-plane temperature-dependent magnetization response (measured at H≃100 Oe) using zero-field cooling (ZFC) and field-cooled warming (FCW) after the applied dc magnetizing … Show more

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Cited by 18 publications
(33 citation statements)
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“…Beyond conventional spin-magnetism of Fe 21 Ni 79 permalloy, which is known to saturate at low magnetic fields, we discovered that the out-of-plane magnetization response of the discontinuous FeNi films exhibits paramagnetic-like behavior in the range of investigated magnetic fields up to 7 T. The anomalous out-of-plane magnetization response quickly decreases on approaching the film percolation threshold due to the nanoisland coalescence. For the same nominal thickness range of the inhomogeneous nanoisland FeNi films on the Sitall (TiO 2 ) substrate, the out-of-plane SFM magnetization behavior was found in our recent study (Stupakov et al 2016). Moreover, the high-field magnetization response exhibits remarkable anisotropy for the studied nanoisland FeNi film samples, where the in-plane response is significantly suppressed.…”
supporting
confidence: 77%
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“…Beyond conventional spin-magnetism of Fe 21 Ni 79 permalloy, which is known to saturate at low magnetic fields, we discovered that the out-of-plane magnetization response of the discontinuous FeNi films exhibits paramagnetic-like behavior in the range of investigated magnetic fields up to 7 T. The anomalous out-of-plane magnetization response quickly decreases on approaching the film percolation threshold due to the nanoisland coalescence. For the same nominal thickness range of the inhomogeneous nanoisland FeNi films on the Sitall (TiO 2 ) substrate, the out-of-plane SFM magnetization behavior was found in our recent study (Stupakov et al 2016). Moreover, the high-field magnetization response exhibits remarkable anisotropy for the studied nanoisland FeNi film samples, where the in-plane response is significantly suppressed.…”
supporting
confidence: 77%
“…In addition, the temperature dependence of their dc conductivity suggests the existence of a percolation transition for this critical FeNi film thickness (Sherstnev 2014;Boltaev et al 2017). Below the percolation transition at the critical thickness d c ≃ 1.8 nm, the FeNi layer has a discontinuous structure (Stupakov et al 2016), where lateral sizes of the nanoislands are 5-30 nm, and the distance between them is less than 5 nm (as schematically illustrated by Fig. 1).…”
mentioning
confidence: 94%
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