Thin Ni–Fe films were produced via electrodeposition onto silicon substrates using direct current and pulse current (with different pulse durations) regimes.
A method for fabricating multilayered quasi one dimensional ferromagnet-diamagnet systems is described by the example of Co-Ni-Fe/Cu nanowires. The fabrication is implemented in a unified techno logical cycle from a combined electrolyte by pulsed potentiostatic electrodeposition. Regimes of the forma tion of layers of different systems, from pure ferromagnetic metals to alloys on their basis, are described. Mechanisms of nanowire growth are proposed. The distribution of chemical elements in the layers is investi gated as a function of the electrolyte composition and the fabrication conditions. The nanowire microstruc ture is investigated by high resolution scanning electron microscopy.
Thin films of beryllium and gold that are several tens of nanometers thick were obtained, for the first time, on silicon and quartz substrates by the ion-beam method with tenfold alternation of deposition and partial sputtering of the nanosized metal layer. Scanning electron and atomic force microscopy indicate the predominant lateral growth of nanosized metal layers along the substrate surface. Optical spectra indicate the suppression of the localized plasmon resonance. The growth of the film occurs under the influence of the high-energy component of the sputtered metal atoms’ flux. The main role in the formation of the nanosized metal film is played by the processes of the elastic collision of incident metal atoms with the atoms of a substrate and a growing metal film. Metal films that are obtained by the tenfold application of the deposition–sputtering of a nanoscale metal layer are characterized by stronger adhesion to the substrate and have better morphological, electrical, and optical characteristics than those that are obtained by means of direct single deposition.
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