Oriented Periodic Mesoporous Organosilica (PMO) Film with Organic Functionality Inside the Channel Walls

Abstract

The first examples of an oriented periodic mesoporous organosilica (PMO) film, containing a variety of organic groups (ethane, ethene, benzene, thiophene) inside the channel walls, are reported. The mesostructure of the PMO film appears oriented with respect to the surface of the underlying glass substrate. Liquid‐crystal topological defects in the precursor gels are replicated in the resulting PMO film and are evident in polarized optical microscopy images, recorded between crossed‐polarizers, which show fan‐type optical birefringence texture characteristic of the mesostructure.

Mesoporous organosilica membranes: Effects of pore geometry and calcination conditions on the membrane distillation performance for desalination

“…Periodic mesoporous organosilica (PMO) is a well-studied subclass that is comprised of covalently-bonded organosilica scaffolds with well-distributed organic moieties within the silica matrix [21,22]. However, there have been very few applications of PMO to membrane distillation.…”

Spin-Coated Periodic Mesoporous Organosilica Thin Films?Towards a New Generation of Low-Dielectric-Constant Materials

“…Lu et al [20] showed the structural characterization, and dielectric constant and mechanical properties, for an ethenesilica PMO film deposited using EISA. Dag et al [21] developed a technique for casting thick PMO films with alkyl, 2,5-thiophene, and 1,4-phenylene bridges using a non-ionic surfactant, but having a relatively low degree of order. Herein, straightforward conditions, using silica and various organosilica precursors (Scheme 1) for fabricating highly ordered, spin-coated mesoporous thin films using an EISA procedure, are presented; the dielectric and mechanical properties of these films are reported.…”

Characteristics of poly(alkyl silsesquioxane) thin films prepared from chemically linked alkyl units

“…5(a), for as-synthesized copolymer, Q (tetra-coordinated Si-O structure) peaks are not found in the À80 to À110 ranges, implying no cleavage of Si-C bonds. On the other hand, T peaks are shown between À80 and À30 ppm corresponding to T 1 (CSi(OSi)(OH) 2 ), T 2 (CSi(OSi) 2 (OH)) and T 3 (CSi(OSi) 3 ) peak, respectively [24]. After treatment at 400°C, T 3 peak intensity increases at the expense of the reduction in T 1 and T 2 peak at À45 and À56 ppm, respectively.…”

“…Before the thermal treatment, the as-cast sample exhibits distinct peaks corresponding to C 12 H 25 at 14.8, 23.6, and 30.8 ppm. It was reported that a peak at 5.5 ppm was assigned to the ethane bridge of BTMSE elsewhere [23][24][25]. Upon the thermal treatment above 400°C, the peak intensities of alkyl groups incorporated significantly decrease, and then nearly disappear after curing at 500°C.…”