2021
DOI: 10.1016/j.vacuum.2021.110556
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Organosilicon films deposited in low-pressure plasma from hexamethyldisiloxane — A review

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Cited by 34 publications
(48 citation statements)
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“…After deposition of the monomer on the leather samples, a decrease in the percentages of carbon and oxygen was observed, much more marked in nitrogen content. However, the silicon content increased significantly in all samples by more than 6% after increasing the deposition time from 180 to 720 s. These results confirmed that a silica-based coating is deposited on the leather surface by the oxygen depletion and total coating of the nitrogen groups of the leather provided by the amides that compose it [ 24 , 30 , 31 ].…”
Section: Resultssupporting
confidence: 64%
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“…After deposition of the monomer on the leather samples, a decrease in the percentages of carbon and oxygen was observed, much more marked in nitrogen content. However, the silicon content increased significantly in all samples by more than 6% after increasing the deposition time from 180 to 720 s. These results confirmed that a silica-based coating is deposited on the leather surface by the oxygen depletion and total coating of the nitrogen groups of the leather provided by the amides that compose it [ 24 , 30 , 31 ].…”
Section: Resultssupporting
confidence: 64%
“…In the case of samples CC-6 and CC-12, the spectra are similar with a large peak of C-C/C-H bonds on the surface and with a small peak attributed to C-Si at 286.0 eV, due to the introduction of the methyl groups present in the HMDSO monomer after its atomic fragmentation, indicating a decrease of the surface oxidation and removing the polar character of the surface. This seems to confirm that the plasma exposure time for an effective deposition and formation of the HMDSO polymeric film could be longer than 180 s [ 24 , 52 , 53 , 54 , 55 ].…”
Section: Resultssupporting
confidence: 54%
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“…Film properties can largely be defined regarding hardness, density, porosity, and wettability, mainly depending on their residual organic (hydrocarbon) content. [7,8] While organic/inorganic multilayers of SiOx found applications in the packaging field acting as barrier coatings, [9] Plasma polymerized SiOx films have also been widely studied as low dielectric constant materials, compared to pure silica, for advanced electronic devices. [10] The crucial element and property in the decrease of the dielectric constant, is the incorporation of carbon and hydrogen in the silicon oxide network, leading to an intrinsic porosity of nanodimensional size in the material.…”
Section: Introductionmentioning
confidence: 99%
“…Compared to other organosilicon monomers, the hexamethyldisiloxane (HMDSO) is one of the most researched precursors for plasma polymerization deposition because it is nontoxic, has a low cost to manufacture, and has been recognized as providing barrier properties for impermeable coatings in many applications. 15 Vautrin-Ul et al 16 investigated the anticorrosion properties of plasma polymerized HMDSO films prepared using mixed precursor feeds of HMDSO and O 2 with different HMDSO/ O 2 ratios and showed that the best protection was achieved when the HMDSO/O 2 ratio was 4/1. Grundmeier et al 17 studied the barrier properties of the ppHMDSO films deposited under different pressure and deposition rate conditions.…”
Section: Introductionmentioning
confidence: 99%