Large-Scale Plasma-Polymerized Hexamethyldisiloxane Thin Films: Role of Interelectrode Distance and Excellent Corrosion Resistance

Abstract

In comparison to the more traditional anticorrosion thin film coatings, the plasma polymerization approach offered a more efficient, dry, and straightforward procedure that made it possible to create dense films of several hundred nanometers in thickness, which has potential applications in metallic implant materials. In this paper, large-scale plasma polymerized hexamethyldisiloxane (ppHMDSO) thin film coatings were deposited on stainless steel substrates at different electrode distances to improve their corrosion resistance. The physicochemical properties and corrosion resistance of the ppHMDSO thin films as prepared at different electrode distances were characterized and gauged utilizing various characterization means. The results indicate that decreasing electrode distance accelerates monomer fragmentation and increases the oxidation process. The deposition rate and roughness of the ppHMDSO films both decreased as the electrode distance increased, while the carbonaceous group and hydrophobicity of the films enhanced. The ppHMDSO film prepared at an electrode distance of 40 mm obtained excellent elastic recovery and wear resistance and had an improved corrosion resistance, resulting in a reduction of 75% of the original corrosion behavior against the corrosion in Hank’s solution. The resulting large-scale ppHMDSO thin film coatings can be further employed in implants for tissue engineering and biomaterials.

Plasma activation mechanisms governed by specific energy input: Potential and perspectives

“…The hydrophobization of textiles and the corrosion protection of biomedical implants are just two examples. [58][59][60] Similarly, atmospheric plasma jets with HMDSO introduced in the postdischarge are used to locally deposit corrosion-resistant coatings on automotive parts. [61] Besides organosilicon compounds, hydrocarbons are frequently used for plasma polymerization.…”

UV-Induced Synthesis of Hybrid HMDSO/SiO2 Thin Films with Compositional Gradients for High-Performance Atomic Oxygen Resistance

“…Furthermore, organosilicon films are made from many precursors/methodologies and have a wide range of applications due to the combination of varied properties and the ability to change them . These films have been utilized for atomic oxygen (AO) protective coatings, , water penetration barriers, oxygen and water vapor barriers, anticorrosion protection, − biocompatible coatings, solar cells, scratch protection, adhesion promotion, etc. For instance, a 400 nm thick plasma-polymerized hexamethyl­disiloxane (pp-HMDSO) film as a protective coating against AO in the space environment was recently deposited by our group on a 1.2 m wide polyimide surface using plasma-enhanced chemical vapor deposition (PECVD), which demonstrated excellent resistance to AO .…”