Plasma activation mechanisms governed by specific energy input: Potential and perspectives

Hegemann, Dirk

doi:10.1002/ppap.202300010

Cited by 8 publications

(3 citation statements)

References 107 publications

(268 reference statements)

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“…For plasma-chemical reaction pathways with one apparent E th and dominant gas-phase reactions (as in plasma-state polymerization), normalized deposition rates (by A dep /F m ) were found to increase linearly with E pl up to E th before slowly reaching saturation following an Arrhenius-type curve (with E pl replacing kT, due to the non-equilibrium conditions) as a consequence of the energy distribution in a plasma with the average value E pl [157]. This situation can be described as…”

Section: A Macroscopic View Of Ppmentioning

confidence: 99%

Foundations of plasma enhanced chemical vapor deposition of functional coatings

Snyders

Hegemann

Thiry

et al. 2023

Plasma Sources Sci. Technol.

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Since decades, the PECVD (“Plasma Enhanced Chemical Vapor Deposition”) processes have emerged as one of the most convenient and versatile approaches to synthesizing either organic or inorganic thin films on many types of substrates, including complex shapes. As a consequence, PECVD is today utilized in many fields of application such as microelectronic circuit fabrication, optics/photonics, biotechnology, energy, smart textiles, and many others. Nevertheless, owing to the complexity of the process including numerous gas phase and surface reactions, the fabrication of tailor-made materials for a given application is still a major challenge in the field making it obvious that the mastery of the technique can only be achieved through the fundamental understanding of the chemical and physical phenomena involved in the film formation.In this context, the aim of this foundation paper is to share with the readers our perception and understanding of the basic principles behind the formation of PECVD layers considering the co-existence of different reaction pathways that can be tailored by controlling the energy dissipated in the gas phase and/or at the growing surface. We demonstrate that the key parameters controlling the functional properties of the PECVD films are similar whether they are inorganic or organic-like (plasma polymers) in nature, thus supporting a unified description of the PECVD process. Several concrete examples of the gas phase processes and the film behavior illustrate our vision.To complete the document, we also discuss the present and future trends in the development of the PECVD processes and provide examples of important industrial applications using this powerful and versatile technology.

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Section: A Macroscopic View Of Ppmentioning

confidence: 99%

Foundations of plasma enhanced chemical vapor deposition of functional coatings

Snyders

Hegemann

Thiry

et al. 2023

Plasma Sources Sci. Technol.

Self Cite

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“…-It determines the rates of various processes occurring in the gas phase (ionization, attachment or excitation) which are crucial in initiating and sustaining the reactions that lead to polymer film growth or modification [90] ; -It impacts the energy of ions and radicals reaching the substrate surface, which in turn can affect film properties such as density, composition and bonding structure. For instance, a high E/N might lead to more fragmentation of precursor molecules and the formation of films with different chemical and physical properties.…”

Section: Reduced Electric Fieldmentioning

confidence: 99%

From Basics to Frontiers: A Comprehensive Review of Plasma-Modified and Plasma-Synthesized Polymer Films

Dufour

2023

Polymers

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This comprehensive review begins by tracing the historical development and progress of cold plasma technology as an innovative approach to polymer engineering. The study emphasizes the versatility of cold plasma derived from a variety of sources including low-pressure glow discharges (e.g., radiofrequency capacitively coupled plasmas) and atmospheric pressure plasmas (e.g., dielectric barrier devices, piezoelectric plasmas). It critically examines key operational parameters such as reduced electric field, pressure, discharge type, gas type and flow rate, substrate temperature, gap, and how these variables affect the properties of the synthesized or modified polymers. This review also discusses the application of cold plasma in polymer surface modification, underscoring how changes in surface properties (e.g., wettability, adhesion, biocompatibility) can be achieved by controlling various surface processes (etching, roughening, crosslinking, functionalization, crystallinity). A detailed examination of Plasma-Enhanced Chemical Vapor Deposition (PECVD) reveals its efficacy in producing thin polymeric films from an array of precursors. Yasuda’s models, Rapid Step-Growth Polymerization (RSGP) and Competitive Ablation Polymerization (CAP), are explained as fundamental mechanisms underpinning plasma-assisted deposition and polymerization processes. Then, the wide array of applications of cold plasma technology is explored, from the biomedical field, where it is used in creating smart drug delivery systems and biodegradable polymer implants, to its role in enhancing the performance of membrane-based filtration systems crucial for water purification, gas separation, and energy production. It investigates the potential for improving the properties of bioplastics and the exciting prospects for developing self-healing materials using this technology.

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“…However, the authors assumed that γ(C 2 H) is lower than 0.1 and thus that S(C 2 H) ≈ 0.8 for all hydrocarbon discharges. This value of S(C 2 H) is commonly used in the literature, [69] particularly for kinetic models of hydrocarbon plasmas. [14,18,28,29,[70][71][72] These values are not in agreement with those obtained in our simulations S(C 2 H) = 0.25 and γ (C 2 H) = 0.55 at steadystate after 15 ns.…”

Section: Surface Loss Probabilities Of Main Neutrals Species During F...mentioning

confidence: 99%

Molecular dynamics approach for the calculation of the surface loss probabilities of neutral species in argon–methane plasma

Otakandza‐Kandjani,

Brault,

Mikikian

et al. 2023

Plasma Processes & Polymers

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Molecular dynamics simulations are carried out for calculating the surface loss probabilities of neutral species from an argon–methane plasma. These probabilities are the sum of the sticking and surface recombination probabilities. This study considers both the formation of reactive and nonreactive volatile species for evaluating recombination probabilities. Results show that stable species are reflected when hydrocarbon film starts growing on the surface. CH3 is mainly lost by surface recombination leading to the formation of volatile products while very little contributes to film growth. C2H has surface loss probability in agreement with the literature. While C2H loss is usually attributed to sticking on the surface, our results show that its main loss process is due to surface recombination.

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Plasma activation mechanisms governed by specific energy input: Potential and perspectives

Cited by 8 publications

References 107 publications

Foundations of plasma enhanced chemical vapor deposition of functional coatings

Foundations of plasma enhanced chemical vapor deposition of functional coatings

From Basics to Frontiers: A Comprehensive Review of Plasma-Modified and Plasma-Synthesized Polymer Films

Molecular dynamics approach for the calculation of the surface loss probabilities of neutral species in argon–methane plasma

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