We present a comparative
investigation between thin films of graphene
oxide (GO) and chemically reduced graphene oxide (rGO) deposited onto
glass substrates via spray pyrolysis. Two reduction techniques are
investigated: (1) the exposition of a sprayed layer of GO to vapors
of hydrazine hydrate to produce rGO
V
and (2) the addition
of liquid hydrazine hydrate to a suspended GO solution, which is then
sprayed onto a substrate to produce rGO
L
. Three different
spectroscopy techniques, Raman, Fourier transform infrared, and UV–Vis–NIR,
show that the two reduced samples have less lattice disorder in comparison
to GO, with rGO
L
having the highest degree of reduction.
Interestingly, topography characterization by atomic force microscopy
reveals a morphological change occurring during the exposure to hydrazine
hydrate vapors, resulting in a thickness of 110 nm for the rGO
V
film, which is a factor of 16 larger than rGO
L
and GO. Finally,
I
–
V
measurements
show a significant decrease of the GO’s resistivity after the
reduction process, where rGO
L
features a resistivity 90
times lower than rGO
V
, confirming that rGO
L
has
the highest degree of reduction. Our results indicate that the reduction
process for rGO
V
is susceptible to introducing intercalated
water molecules in the material while the fabrication technique for
rGO
L
is a suitable route to obtain a material with minimal
lattice disorder and properties approaching those of graphene.