Organic Monolayer Determination on Semiconductor Substrates

Guerrero, Douglas J.; Lowes, Joyce; Mercado, Ramil

doi:10.2494/photopolymer.20.339

Cited by 4 publications

(8 citation statements)

References 3 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Residue thickness from HfO 2 was half that of silicon, with SiO 2 showing the least amount of residue. The reduced residue result with SiO 2 aligns with previous results from photosensitive DBARC testing (7). To further explore the relationship between SiO 2 substrates and residue, the native oxide of a silicon wafer was mapped, then ARC ® DS-K101 coating was applied to the wafer and developed away.…”

Section: -Mm Proximity Bakedsupporting

confidence: 73%

“…A linear trend resulted, indicating that increases in native SiO 2 produce less PDR. The proposal that a thick film of SiO 2 would decrease the surface silicon sites available for DBARC to bind to was previously proposed (7). This concept was supported by these results in that as the native oxide increases, it may become less and less ordered like pure silicon.…”

Section: -Mm Proximity Bakedmentioning

confidence: 66%

“…Next, the DBARC, Brewer Science™ ARC ® DS-K101 coating, was dispensed onto the wafer. Cauchy coefficients of the DBARC were then recorded from the SE and the wafer was developed in 0.26N TMAH with a surfactant (7). Finally, the substrate was measured again with the SE.…”

Section: Experimental Methodsmentioning

confidence: 99%

See 2 more Smart Citations

Residue Testing of Developer-Soluble Bottom Anti-Reflective Coatings

2009

View full text Add to dashboard Cite

Organic developer-soluble bottom anti-reflective coatings (DBARCs) are commonly used in the photolithographic process for implant and high-k/metal gate integration. They provide added reflectivity control over topography compared top anti-reflective coatings (TARCs). DBARCs are coated onto substrates and then removed during the develop step with the resist. Occasionally a thin post-develop residue (PDR) remains after the DBARC removal process. The main drivers of this residue are DBARC bake temperature, followed by develop time. For this investigation the amount of residue was tested using Si, SiO 2 , native SiO 2 , SiN, and HfO 2 substrates at different bake temperatures. In addition, contact and proximity baking are compared and shown to be equivalent in terms of their effect on PDR. This work demonstrates that optimizing the bake process of a DBARC is an effective way to control PDR on a variety of substrates.

show abstract

Section: -Mm Proximity Bakedsupporting

confidence: 73%

Section: -Mm Proximity Bakedmentioning

confidence: 66%

See 1 more Smart Citation

Residue Testing of Developer-Soluble Bottom Anti-Reflective Coatings

2009

View full text Add to dashboard Cite

show abstract

“…A significant amount of research has gone into quantifying and understanding the trends of residue produced by different DBARCs. The residue has been quantified using ellipsometry, X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM) (9,18,19,20,21,22). Trends through processing conditions have also been evaluated.…”

Section: High-k Metal Gate (Hkmg) Processesmentioning

confidence: 99%

“…The chemistry components, thickness, and exposure dose all affected the post-develop residue (9,21,22). In both PS and non-PS DBARCs, it was found that the substrate also influenced the residue (19,20). With the diverse factors that are involved with residue, it is a challenge that will continue to garner focus, especially as HKMG processes move into production.…”

Section: High-k Metal Gate (Hkmg) Processesmentioning

confidence: 99%

Use of DBARCs Beyond Implant

Washburn

Lowes²,

Guerrero³

2011

ECS Trans.

View full text Add to dashboard Cite

Almost a decade ago, the integrated circuit (IC) industry realized that traditional implant layers required new technology to achieve the specifications of the shrinking design rules and increased topography effects. In response, developer-soluble bottom antireflective coatings (DBARCs) were introduced as a solution. DBARCs offered the resolution and critical dimension (CD) control needed for the increasingly critical implant layers.In this paper the benefits DBARCs can bring to other lithographic processes are reviewed. Back-end-of-line (BEOL) dual damascene processes are surveyed. Front-end-of-line (FEOL) processes are examined, including high-k metal gate (HKMG), double patterning, and spacer. All processes are defined, and the value that a DBARC brings to each process is examined, along with potential challenges.

show abstract

Comparative Study of Photosensitive Versus Non-Photosensitive Developer-Soluble Bottom Anti-Reflective Coating Systems

Lowes¹,

Stroud²,

Guerrero³

et al. 2010

ECS Trans.

View full text Add to dashboard Cite

Developer-soluble bottom anti-reflective coatings (DBARCs) were originally designed for use in implant lithography processes. Throughout the development cycle, two main DBARC platforms emerged, nonphotosensitive DBARC (non-PS DBARC) and photosensitive DBARC (PS DBARC). While both platforms have been able to achieve acceptable performance for implant processes, each has advantages and disadvantages. The characteristics of each system are used to recommend a platform for use in various implant processes. DBARC processes are now being compared to single-layer resist and dry BARC processes due to additional applications such as wet-etch layers for high-k dielectric metal gate (HKMG). Integrating a new technology into production is complicated. Therefore, for each of these new applications, the different DBARC platforms have been reviewed to compare performance. The analysis allows us to recommend a DBARC and a favorable process for each application, thereby decreasing development time and cost.

show abstract

Organic Monolayer Determination on Semiconductor Substrates

Cited by 4 publications

References 3 publications

Residue Testing of Developer-Soluble Bottom Anti-Reflective Coatings

Residue Testing of Developer-Soluble Bottom Anti-Reflective Coatings

Use of DBARCs Beyond Implant

Comparative Study of Photosensitive Versus Non-Photosensitive Developer-Soluble Bottom Anti-Reflective Coating Systems

Contact Info

Product

Resources

About